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Item An alloy containing 49 at.% aluminium was heat treated at different temperatures within the ? + ? two-phase field to get five different volume fractions of lamellar constituent. Creep studies were carried out on these samples at five different temperatures in the interval between 1023 and 1223 K, by impression creep technique using four levels of stresses at each temperature. For a given temperature and stress, steady state impression velocity decreased with increasing volume fraction of lamellar constituent. Activation energy for steady state creep increased linearly with lamellar content from 185 kJ/mol at 22 vol.% to 362 kJ/mol at 100 vol.%. The stress exponent was found to be around 1.2 in all the cases. The results show that a fully lamellar structure has a superior behaviour where creep is an important factor.(Carl Hanser Verlag, Effect of microstructure on the impression creep of two-phase titanium aluminide) Prasad Rao, P.; Swamy, K.Shivananda1995Item Semiconducting thin films of cadmium telluride, both p-type and n-type, have been prepared by conventional thermal evaporation technique. The influence of various growth parameters such as the rate of deposition, deposition temperature, post-deposition heat treatment, and source material composition has been investigated. The films deposited at high deposition rates and low substrate temperatures exhibited an excess of tellurium and showed a p-type conductivity, whereas those deposited at high substrate temperature and low deposition rates contained excess cadmium and are n-type in nature. An intrinsic bandgap of 1.49 eV for stoichiometric films obtained by both electrical and optical characterization is reported.(Growth and characterization of vacuum deposited cadmium telluride thin films) Shreekanthan, K.N.; Kasturi, V.B.; Shivakumar, G.K.2003Item The inhibiting effect of N - cyclohexyl - N?- phcnyl thiourea (CPTU) and N-naphthyl-N?- phenyl thiourea (NPTU) on the corrosion of mild steel in aqueous solution of 0.1 N H2SO4 have been demonstrated using potentiodynamic polarization technique. The polarization data have shown that these compounds act as efficient anodic inhibitors for mild steel. Adsorption of these compounds on the mild steel surface was found to obey Temkin's adsorption isotherm. Good inhibition efficiency (IE) was evidenced in both the compounds and it was found to vary with concentration of the inhibitors. The kinetic parameters of adsorption obtained reveal spontaneous adsorption and a strong interaction of the compounds on the mild steel surface. © 2006 SAEST.(Inhibition of mild steel corrosion in sulphuric acid solution) Divakara Shetty, S.; Shetty, P.; Sudhaker Nayak, H.V.2006Item Trifluoromethyl-quinolin-yl-thio-propanohydrazide as an effective inhibitor of mild steel corrosion in HCl solution(2006) Ramesh Saliyan, V.; Vasudeva Adhikari, A.V.3-{[8-(trifluoromethyl)quinolin-4-yl]thio}propanohydrazide(TFQTPH) was synthesized, characterized and tested as a corrosion inhibitor for mild steel in 1 M HCl and 2 M HCl solution using different techniques: potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). The results showed that TFQTPH is an excellent inhibitor for mild steel in acid medium. The inhibition was assumed to occur via adsorption of the inhibitor molecule on the metal surface. In the temperature range 20° to 60° C, the TFQTPH adsorption follows Langmuir isotherm model. The protection efficiency increased with increasing inhibitor concentration (10 to 500 ppm), even at higher temperature also, it recorded good inhibition efficiency. © 2006 SAEST.Item Quinolin-5-ylmethylene-3-{[8-(trifluoromethyl)quinolin-4-yl]thio}propanohydrazide as an effective inhibitor of mild steel corrosion in HCl solution(2008) Saliyan, V.R.; Vasudeva Adhikari, A.V.Quinolin-5-ylmethylene-3-{[8-(trifluoromethyl)quinolin-4-yl]thio}propanohydrazide (QMQTPH) was synthesized, characterized and tested as a corrosion inhibitor for mild steel in 1 M and 2 M HCl solution using potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). Polarization resistances calculated from the EIS measurements were in good agreement with those obtained from direct current (DC) polarization measurements. The mild steel samples were also analyzed by scanning electron microscopy (SEM). The results showed that QMQTPH is an excellent inhibitor for mild steel in acid medium. The inhibition was assumed to occur via adsorption of the inhibitor molecule on the metal surface. It acts as an anodic inhibitor. In the 30° to 60 °C temperature range, the QMQTPH adsorption follows Langmuir isotherm model. The protection efficiency increased with increasing inhibitor concentration in the range 10-5 - 10-3 M, but slightly decreased with increasing temperature. © 2007 Elsevier Ltd. All rights reserved.Item Characterization of thin film Al/p-CdTe schottky diode(2008) Mahesha, M.G.; Kasturi, V.B.; Shivakumar, G.K.A study has been made on the behavior of Al/p-CdTe thin film junction grown by thermal evaporation method. I-V characteristics show that the Al makes Schottky contact with p-CdTe. The variation of junction capacitance with frequency and voltage has been studied to evaluate the barrier height. The activation energy and band gap have been estimated by studying variation of resistivity with temperature. Using all these data, band diagram of Al/p-CdTe has been proposed. © TÜB?TAK.Item Inhibition of corrosion of mild steel in acid media by N'-benzylidene-3- (quinolin-4-ylthio)propanohydrazide(2008) Ramesh Saliyan, V.; Vasudeva Adhikari, A.V.In the present investigation a new corrosion inhibitor, N'-(3,4-dihydroxybenzylidene)-3-{[8-(trifluoromethyl)quinolin-4-yl]thio} propanohydrazide(DHBTPH) was synthesized, characterized and tested as a corrosion inhibitor for mild steel in HCl (1 M, 2 M) and H2SO 4 (0.5 M, 1 M) solutions using weight-loss method, electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization methods. The corrosion inhibition efficiency measured by all the above three techniques were in good agreement with each other. The results showed that DHBTPH is a very good inhibitor for mild steel in acidic media. The inhibition efficiency in different acid media was found to be in the decreasing order 0.5 M H 2SO4 > 1 M HCl > 1M H2SO4 > 2 M HCL The inhibition efficiency increases with increasing inhibitor concentration and with increasing temperature. It acts as an anodic inhibitor. Thermodynamic and activation parameters are discussed. Adsorption of DHBTPH was found to follow the Langmuir's adsorption isotherm. Chemisorption mechanism is proposed. The mild steel samples were also analysed by scanning electron microscopy (SEM). © Indian Academy of Sciences.Item Thermal degradation and swelling of thermoplastic vulcanizates from NBR/SAN and NBR/Scrap computer plastics blends(Huthig GmbH, 2009) Anandhan, S.; Rajeev, R.S.; De, S.K.; Bhowmick, A.K.Thermoplastic elastomeric blends of nitrile rubber (NBR)/poly(styrene- coacrylonitrile) (SAN) and NBR/scrap computer plastics (SCP) based on acrylonitrile-butadiene-styrene terpolymer (ABS) were prepared. Thermoplastic elastomeric blends of NBR/SAN containing various amounts of a model waste nitrile rubber powder (w-NBR) were also prepared. Thermogravimetric analysis of the above blends was performed in a nitrogen atmosphere. Both Friedman and Flynn-Wall-Ozawa methods were used for the evaluation of activation energies of thermal degradation of these blends. The dynamically vulcanised blends exhibit higher amount of activation energies for thermal degradation than the unvulcanised ones. Swelling studies were performed in various solvents having different solubility parameter values and maximum swelling was found to occur in a solvent having a solubility parameter that was closer to that of the blend components, i.e., around 20MPa1/2. Dynamically vulcan-ised blends show excellent resistance to IRM #903 oil as well as four chosen solvents possessing different solubility parameters (E).Item The effect of substrate temperature on the structural, optical and electrical properties of vacuum deposited ZnTe thin films(2009) Rao, G.K.; Bangera, K.V.; Shivakumar, G.K.The present paper reports the effect of substrate temperature on the structural, optical and electrical properties of vacuum deposited zinc telluride (ZnTe) thin films. X-ray diffraction (XRD) analysis of the films, deposited on glass substrates, revealed that they have cubic structure with strong (111) texture. Room temperature deposits are tellurium rich and an increase in the substrate temperature up to 553 °K results in stoichiometric films. Electrical conductivity has been observed to increase with the increase in substrate temperature, accompanied by increase in the carrier concentration and the mobility of the carriers. The optical bandgap energy and the thermal activation energy of the films have also been evaluated. © 2009 Elsevier Ltd. All rights reserved.Item Investigation into creep behaviour of Sn-40%Pb alloy using impression creep method(2009) Udaya Prasanna, H.U.; Udupa, K.R.; Prabhu, K.N.The creep behaviour of Sn-40%Pb hypereutectic alloys cast in the molds made of different materials was investigated using impression creep technique in the temperature range from zero to 32 °C and under the punching stress of 50 MPa. The creep curves.ie, profiles of indentation depth against time are generated and steady state creep rates (SSCRs) are determined. Activation energy was calculated knowing creep rates at different temperature levels. Standard metallographic technique was used to determine the grain size of alloys which were poured into different molds. It was found that SSCR, at all the temperature levels of testing, is a function of grain size of the material. The activation energy being in the range of 10kJ/mol -12 kJ/mol, suggests that the probable creep mechanism is dislocation glide aided by vacancy diffusion. Results of the experiments are discussed.