Fabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue
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Date
2012
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Abstract
Single-mode small-core (?2 ?m × 2 ?m) Y-branch waveguide structures in photosensitive polymer have been fabricated. Y-branch waveguides are designed by the beam propagation method and Y-branch waveguides are obtained on development after a cross-linkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Optical Adhesive NOA 61 is used as under- and over-clad. The fabrication process is optimized to avoid polymer residue at the Y-junction. The average insertion loss obtained for a 7.2 mm 1 × 2 device at chip-level is ?13 dB at 1550 nm. © 2011 Elsevier GmbH.
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Keywords
1550 nm, Chip-level, Cross-linkable, Fabrication process, Negative tones, Optical adhesive, Optical splitter, Photosensitive polymers, Polymer residue, Polymer waveguides, Single mode, Y-branch waveguides, Y-junctions, Beam propagation method, Fabrication, Light sensitive materials, Waveguide components, Polymers
Citation
Optik, 2012, 123, 21, pp. 1911-1914