Fabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue

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dc.contributor.authorSinghal, R.
dc.contributor.authorSatyanarayan, M.N.
dc.contributor.authorPal, S.
dc.date.accessioned2026-02-05T09:35:08Z
dc.date.issued2012
dc.description.abstractSingle-mode small-core (?2 ?m × 2 ?m) Y-branch waveguide structures in photosensitive polymer have been fabricated. Y-branch waveguides are designed by the beam propagation method and Y-branch waveguides are obtained on development after a cross-linkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Optical Adhesive NOA 61 is used as under- and over-clad. The fabrication process is optimized to avoid polymer residue at the Y-junction. The average insertion loss obtained for a 7.2 mm 1 × 2 device at chip-level is ?13 dB at 1550 nm. © 2011 Elsevier GmbH.
dc.identifier.citationOptik, 2012, 123, 21, pp. 1911-1914
dc.identifier.issn304026
dc.identifier.urihttps://doi.org/10.1016/j.ijleo.2011.08.039
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/26943
dc.subject1550 nm
dc.subjectChip-level
dc.subjectCross-linkable
dc.subjectFabrication process
dc.subjectNegative tones
dc.subjectOptical adhesive
dc.subjectOptical splitter
dc.subjectPhotosensitive polymers
dc.subjectPolymer residue
dc.subjectPolymer waveguides
dc.subjectSingle mode
dc.subjectY-branch waveguides
dc.subjectY-junctions
dc.subjectBeam propagation method
dc.subjectFabrication
dc.subjectLight sensitive materials
dc.subjectWaveguide components
dc.subjectPolymers
dc.titleFabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue

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