Investigation of Performance Improvement in Drain Extended Longitudinal FinFETs for Thermal-aware Sustainable Electronics Applications
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Date
2025
Authors
Journal Title
Journal ISSN
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Publisher
Springer Science and Business Media B.V.
Abstract
This work presents a comprehensive investigation of GaN-based Junctionless Drain Extended Longitudinal FinFET (DELFinFET) using Sentaurus TCAD simulations, targeting thermally robust and energy efficient semiconductor devices as a means to reduce the environmental footprint of electronic devices. Introducing a longitudinal fin achieves superior lateral electric field modulation, improved carrier transport, and enhanced electric control. This helps in improving the key analog performance metrics such as sub-threshold slope, leakage current (Ioff), transconductance (gm), and the switching ratio (Ion/Ioff). The results obtained highlight the potential of DELFinFET for low-power applications. A comparative evaluation is performed between the designed device and other device configurations to verify the effectiveness of the design. © The Author(s), under exclusive licence to Springer Nature B.V. 2025.
Description
Keywords
Electronic design automation, Energy efficiency, FinFET, Gallium nitride, Leakage currents, Low power electronics, Semiconductor device models, Semiconductor junctions, Thermal management (electronics), Thermoelectric equipment, Wide band gap semiconductors, Drain extended longitudinal FinFET, Electronics applications, FinFETs, GaN based, Low Power, Performance, Sustainable electronics, TCAD, TCAD simulation, Thermal-Aware, III-V semiconductors
Citation
Silicon, 2025, , , pp. -
