METHOD AND COMPOSITION FOR FABRICATING A HIGH-K DIELECTRIC MATERIAL

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dc.contributor.authorNational Institute of Technology Karnataka
dc.contributor.authorJagannathan T. K.
dc.contributor.authorKishor Kumar M. J
dc.date.accessioned2022-01-19T11:15:43Z
dc.date.available2022-01-19T11:15:43Z
dc.date.issued2021-05-28
dc.descriptionPatent Filed Date: 23.11.2019 ; Published Date: 28.05.2021en_US
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/16975
dc.language.isoenen_US
dc.publisherIndian Patent Office, Chennaien_US
dc.relation.ispartofseries201941047909;
dc.subjectCOMPOSITIONen_US
dc.subjectFABRICATINGen_US
dc.subjectHIGH-K DIELECTRIC MATERIALen_US
dc.titleMETHOD AND COMPOSITION FOR FABRICATING A HIGH-K DIELECTRIC MATERIALen_US
dc.typeOtheren_US

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