Faculty Publications
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Item Optimized electronic performance in half-Heusler Ti-doped NbFeSb materials by stoichiometric tuning at the Fe and Sb sites(Elsevier Ltd, 2022) Kahiu, J.N.; Shenoy, U.S.; Kihoi, S.K.; Kim, H.; Yi, S.; Bhat, D.K.; Lee, H.S.Electronic structure is known to be highly influenced by the site occupancy and the stoichiometry of the material which in turn largely effects the thermoelectric properties. Herein, we present electronic calculations using density functional theory (DFT) of non-stoichiometric Ti doped NbFeSb configuration, showing the effect of the anti-site Fe atoms on the electronic properties, and supporting them with experimental results of the prepared Nb0.8Ti0.2Fe1+xSb1−x samples. The electronic structure of the non-stoichiometric sample shows the introduction of two distinct peaks near the Fermi level by the Fe atoms at the Sb sites. These resonance states are known to cause an increase in the density of states effective mass near the Fermi level, which explains the increase in the Seebeck coefficient in the sample x = 0.03 compared to the sample x = 0.00. In addition, a comparatively higher electrical conductivity is reported from sample x = 0.03, which is attributed to the aliovalent substitution of Sb atoms by Fe atoms. The simultaneous increase in the Seebeck coefficient and electrical conductivity culminates in an increased power factor of ∼50.3 µW/cmK2 at 373 K, which is ∼46% higher than that of samples x = 0.00 and x = 0.05, highlighting the possibility of increasing the power density by stoichiometric variation to achieve the high joule-per-dollar performance of NbFeSb-based TE devices, the relevance of which is also currently emphasized in the quest for commercial viability. © 2021 Elsevier B.V.Item Tailoring the Thermoelectric Performance of the Layered Topological Insulator SnSb2Te4 through Bi Positional Doping at the Sn and Sb Cation Sites(American Chemical Society, 2023) Kihoi, S.K.; Shenoy, U.S.; Kahiu, J.N.; Kim, H.; Bhat, D.K.; Lee, H.S.Ongoing research and development focus on emerging thermoelectric materials with enhanced performance, continually making the possibility of waste heat recovery a reality. In this work, we engineer the thermoelectric properties of the layered SnSb2Te4 topological insulators. To date, there is little research reporting on these materials as potential state-of-the-art thermoelectric materials. Thus, there is a need to formulate effective strategies to realize this potential. Since these materials are known to have intrinsically low lattice thermal conductivity, we shift our attention to improving the electrical transport properties. For the first time, positional Bi doping at both the Sn and Sb cation sites is adopted. The aliovalent and isovalent nature of Bi at these sites, respectively, is shown to cause significant improvements in the performance of these layered materials. The electronic band structure of the pure and doped samples, where we considered various occupancies, is studied whereby we reveal the occurrence of band convergence and resonant levels resulting in a high power factor of ∼10.8 μW cm-1 K-2 at 623 K. Overall, a high ZT of ∼0.46 at a relatively lower temperature of 673 K is recorded. The potential of these materials for thermoelectric applications is shown, especially in the case of Bi doping at the Sn cation site. Continued efforts to enhance the thermoelectric performance of these topological insulators are needed for them to gain a substantial competitive edge in comparison to other state-of-the-art thermoelectric materials. © 2023 American Chemical Society.