Faculty Publications
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Item Superior Photostability and Photocatalytic Activity of ZnO Nanoparticles Coated with Ultrathin TiO2 Layers through Atomic-Layer Deposition(Wiley-VCH Verlag info@wiley-vch.de, 2015) Sridharan, K.; Jang, E.; Park, Y.M.; Park, T.J.Atomic-layer deposition (ALD) is a thin-film growth technology that allows for conformal growth of thin films with atomic-level control over their thickness. Although ALD is successful in the semiconductor manufacturing industry, its feasibility for nanoparticle coating has been less explored. Herein, the ALD coating of TiO2 layers on ZnO nanoparticles by employing a specialized rotary reactor is demonstrated. The photocatalytic activity and photostability of ZnO nanoparticles coated with TiO2 layers by ALD and chemical methods were examined by the photodegradation of Rhodamine B dye under UV irradiation. Even though the photocatalytic activity of the presynthesized ZnO nanoparticles is higher than that of commercial P25 TiO2 nanoparticles, their activity tends to decline due to severe photocorrosion. The chemically synthesized TiO2 coating layer on ZnO resulted in severely declined photoactivity despite the improved photostability. However, ultrathin and conformal ALD TiO2 coatings (?0.75-1.5 nm) on ZnO improved its photostability without degradation of photocatalytic activity. Surprisingly, the photostability is comparable to that of pure TiO2, and the photocatalytic activity to that of pure ZnO. © 2015 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.Item Eliminated Phototoxicity of TiO2Particles by an Atomic-Layer-Deposited Al2O3Coating Layer for UV-Protection Applications(Wiley-VCH Verlag, 2016) Jang, E.; Sridharan, K.; Park, Y.M.; Park, T.J.We demonstrate the conformal coating of an ultrathin Al2O3layer on TiO2nanoparticles through atomic layer deposition by using a specifically designed rotary reactor to eliminate the phototoxicity of the particles for cosmetic use. The ALD reactor is modified to improve the coating efficiency as well as the agitation of the particles for conformal coating. Elemental and microstructural analyses show that ultrathin Al2O3layers are conformally deposited on the TiO2nanoparticles with a controlled thickness. Rhodamine B dye molecules on Al2O3-coated TiO2exhibited a long life time under UV irradiation, that is, more than 2 h, compared to that on bare TiO2, that is, 8 min, indicating mitigation of photocatalytic activity by the coated layer. The effect of carbon impurities in the film resulting from various deposition temperatures and thicknesses of the Al2O3layer on the photocatalytic activity are also thoroughly investigated with controlled experimental condition by using dye molecules on the surface. Our results reveal that an increased carbon impurity resulting from a low processing temperature provides a charge conduction path and generates reactive oxygen species causing the degradation of dye molecule. A thin coated layer, that is, less than 3 nm, also induced the tunneling of electrons and holes to the surface, hence oxidizing dye molecules. Furthermore, the introduction of an Al2O3layer on TiO2improves the light trapping thus, enhances the UV absorption. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim