Eliminated Phototoxicity of TiO2Particles by an Atomic-Layer-Deposited Al2O3Coating Layer for UV-Protection Applications

Abstract

We demonstrate the conformal coating of an ultrathin Al<inf>2</inf>O<inf>3</inf>layer on TiO<inf>2</inf>nanoparticles through atomic layer deposition by using a specifically designed rotary reactor to eliminate the phototoxicity of the particles for cosmetic use. The ALD reactor is modified to improve the coating efficiency as well as the agitation of the particles for conformal coating. Elemental and microstructural analyses show that ultrathin Al<inf>2</inf>O<inf>3</inf>layers are conformally deposited on the TiO<inf>2</inf>nanoparticles with a controlled thickness. Rhodamine B dye molecules on Al<inf>2</inf>O<inf>3</inf>-coated TiO<inf>2</inf>exhibited a long life time under UV irradiation, that is, more than 2 h, compared to that on bare TiO<inf>2</inf>, that is, 8 min, indicating mitigation of photocatalytic activity by the coated layer. The effect of carbon impurities in the film resulting from various deposition temperatures and thicknesses of the Al<inf>2</inf>O<inf>3</inf>layer on the photocatalytic activity are also thoroughly investigated with controlled experimental condition by using dye molecules on the surface. Our results reveal that an increased carbon impurity resulting from a low processing temperature provides a charge conduction path and generates reactive oxygen species causing the degradation of dye molecule. A thin coated layer, that is, less than 3 nm, also induced the tunneling of electrons and holes to the surface, hence oxidizing dye molecules. Furthermore, the introduction of an Al<inf>2</inf>O<inf>3</inf>layer on TiO<inf>2</inf>improves the light trapping thus, enhances the UV absorption. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim