Conference Papers
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Item Reduction of oxygen vacancy related defects in RF sputtered deposited ZnO films by impurity (Phosphorus) incorporation(SPIE, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; das Gupta, K.D.; Chakrabarti, S.ZnO is a fascinating wide gap (3.37 eV) semiconductor due to its tunable optical and electrical properties, which can be utilized for several nanodevices such as nanogenerators, photodetectors, sensors, lasers, and TFTs. In this study, we have investigated the effect of the incorporation of dopants on the native defects and corresponding optical properties of ZnO. We have prepared three samples for the current study and such samples are named samples Z-0, Z-1, and Z-2 for undoped ZnO film, undoped ZnO film annealed at 800°C, and phosphorus doped ZnO film by using spin-on dopant method at an elevated temperature of 800°C, respectively. The XRD results show a dominant peak along the (002) plane for all samples. The Room-temperature photoluminescence spectra reveal that the broad peak around 542 nm for sample Z-0 gradually shifts towards the UV region for samples Z-1 and Z-2 and appears around 509 nm and 413 nm, respectively. Significantly, such blue emission is associated with the transitions from oxygen vacancies to valence band or zinc interstitial to valance band. Also, relatively huge reductions in oxygen vacancies are observed in phosphorus doped ZnO films as compared with undoped and undoped-anneal films. Further, we have verified such reductions in oxygen vacancies with XPS O-1s spectra-related peaks (~531-532 eV) with high-temperature annealing and phosphorus doping. Therefore, such a type of oxygen vacancy reduction in ZnO films by cost-effective SOD doping technique is highly essential for developing several ZnObased functional devices. © 2022 SPIE.Item Temperature Induced Conductivity Reversal in ZnO Thin Films(SPIE, 2023) Mishra, M.; Bhowmick, S.; Saha, R.; Pandey, S.K.; Chakrabarti, S.ZnO is a fascinating large gap (3.37 eV) semiconductor, which exhibits intrinsically n-type conductive due to its native defects such as zinc interstitials and oxygen vacancies and such n-type related defects tend to compensate the p-type acceptor defects. However, the generation process of p-type defects is more challenging for developing a good quality homojunction optical device. Here we have studied the effect of ex-situ atmospheric annealing on conductivity of ZnO films. The ZnO films were deposited using RF sputtering on Si substrate temperature at 400°C substrate temperature and 2.2E-2 mbar gas pressure. The films were deposited in oxygen-rich ambient to achieve less oxygen vacancy defects in the film. The ex-situ atmospheric annealing is performed at higher temperature of 900 and 1000ºC. The effects of this post-deposition annealing on the electrical, structural, elemental and optical properties of ZnO thin films were investigated in detail. The X-ray Diffraction (XRD) results exhibited the hexagonal wurtzite structure (002) orientation. After annealing, the XRD peak is shifted at higher 2-thetha value, which indicates a reduction in lattice constant. Further, X-ray photoelectron spectroscopy (XPS) had been done and such XPS results confirmed that simultaneous generation of acceptor defects and reduction of oxygen vacancy related donor concentrations. The electrical properties of films were studied using hall measurement system. These electrical parameters were purposive to inspect the effect of ex-situ atmospheric annealing temperatures on conductivity of films. The Hall measurement confirmed that 1000ºC annealed films achieve p-type conductivity with high reproducibility and such p-type behavior exhibits high mobility. Thus, temperature induced conductivity reversal could be a potential and cost-effective technique to achieve highly stable p-type ZnO films. © 2023 SPIE.