Singhal, R.Satyanarayan, M.N.Pal, S.2026-02-052012Optik, 2012, 123, 21, pp. 1911-1914304026https://doi.org/10.1016/j.ijleo.2011.08.039https://idr.nitk.ac.in/handle/123456789/26943Single-mode small-core (?2 ?m × 2 ?m) Y-branch waveguide structures in photosensitive polymer have been fabricated. Y-branch waveguides are designed by the beam propagation method and Y-branch waveguides are obtained on development after a cross-linkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Optical Adhesive NOA 61 is used as under- and over-clad. The fabrication process is optimized to avoid polymer residue at the Y-junction. The average insertion loss obtained for a 7.2 mm 1 × 2 device at chip-level is ?13 dB at 1550 nm. © 2011 Elsevier GmbH.1550 nmChip-levelCross-linkableFabrication processNegative tonesOptical adhesiveOptical splitterPhotosensitive polymersPolymer residuePolymer waveguidesSingle modeY-branch waveguidesY-junctionsBeam propagation methodFabricationLight sensitive materialsWaveguide componentsPolymersFabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue