Reddy, S.K.Sahu, S.K.Khoja, R.Kanu, S.Singh, M.2026-02-042022Plasmonics, 2022, 17, 1, pp. 257-26315571955https://doi.org/10.1007/s11468-021-01517-3https://idr.nitk.ac.in/handle/123456789/22694A complementary metal oxide semiconductor (CMOS) compatible photonic-plasmonic waveguide with nanoscale dimensions and better optical confinement has been proposed for the infrared (IR)–band applications. The design is based on the multi-layer hybrid plasmonic waveguide (Si–SiO<inf>2</inf>–Au) structure. The 3D-finite element method (FEM)–based numerical simulations of single slot hybrid plasmonic waveguide (HPWG) confirms 2.5 dB/cm propagation loss and 15 μm−2 confined intensity. Moreover, its application as dual-slot nanograting is studied with higher propagation length and ultra–low–dispersion near the 1550–nm wavelength. The proposed low-dispersion nanoscale grating design is suitable for future lab–on–chip nanophotonic integrated circuits. © 2021, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.DispersionFinite element methodHybrid plasmonic waveguideNanogratingSurface plasmon