Sibin, K.P.Srinivas, G.Shashikala, H.D.Dey, A.Sridhara, N.Sharma, A.K.Barshilia, H.C.2020-03-302020-03-302018Materials Today: Proceedings, 2018, Vol.5, 4, pp.10787-10791https://idr.nitk.ac.in/handle/123456789/8633Transparent and conducting thin films on flexible substrates have enormous applications in the areas of space, solar, displays, etc. We hereby report the sputter deposition of transparent and conducting ITO/Ag/ITO (IAI) thin films on commercially available flexible Kapton� substrate at a lower substrate temperature. IAI multilayer has been deposited by magnetron sputtering system using an alloy In:Sn (90% :10%) and Ag targets at room temperature without breaking the vacuum. The optimized IAI coating shows high transmittance (?81.3 % at ?= 650 nm) along with very low resistance (8.36 ?/). Optical haze value of IAI on Kapton was measured and found to be <7%. The figure of merit of IAI coating on Kapton� has been calculated using the Haacke's formula ? = r10/Rs. At ?= 650 nm ? = 15 � 10 ? was observed. Our findings give worthful insight into the sputter deposition of transparent conducting IAI coating on flexible Kapton� substrate for flexible electronics applications. � 2017 Elsevier Ltd. All rights reserved.Book chapter