Sibin, K.P.Srinivas, G.Shashikala, H.D.Dey, A.Sridhara, N.Sharma, A.K.Barshilia, H.C.2026-02-062018Materials Today: Proceedings, 2018, Vol.5, 4, p. 10787-10791https://doi.org/10.1016/j.matpr.2017.12.363https://idr.nitk.ac.in/handle/123456789/31644Transparent and conducting thin films on flexible substrates have enormous applications in the areas of space, solar, displays, etc. We hereby report the sputter deposition of transparent and conducting ITO/Ag/ITO (IAI) thin films on commercially available flexible Kapton® substrate at a lower substrate temperature. IAI multilayer has been deposited by magnetron sputtering system using an alloy In:Sn (90% :10%) and Ag targets at room temperature without breaking the vacuum. The optimized IAI coating shows high transmittance (∼81.3 % at γ= 650 nm) along with very low resistance (8.36 ω/). Optical haze value of IAI on Kapton was measured and found to be <7%. The figure of merit of IAI coating on Kapton® has been calculated using the Haacke's formula π = r10/Rs. At γ= 650 nm π = 15 × 10 ω was observed. Our findings give worthful insight into the sputter deposition of transparent conducting IAI coating on flexible Kapton® substrate for flexible electronics applications. © 2017 Elsevier Ltd. All rights reserved.ITO/Ag/ITOKaptonSputteringTransparent electrode