Navya, K.Bharath, S.P.Bangera, K.V.Shivakumar, G.K.2026-02-052018Materials Research Express, 2018, 5, 9, pp. -https://doi.org/10.1088/2053-1591/aad616https://idr.nitk.ac.in/handle/123456789/25016Transparent I<inf>x</inf>T<inf>1-x</inf>O (x = 0 to 1) alloyed thin films were deposited by spray pyrolysis technique at a substrate temperature of 400 °C. The effect of incorporation of indium on structural, optical and electrical properties of tin oxide thin films were studied. Characterization of thin films was carried out using x-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDAX), UV-Visible absorption spectroscopy. XRD results revealed that I<inf>x</inf>T<inf>1-x</inf>O thin films were polycrystalline in nature with good crystallinity. Incorporation of indium effectively modifies the surface morphology of the films. The band gap was varied from 3.7 eV to 3 eV. Maximum electrical conductivity of 44.52 × 103 ?-1 m-1 and transmittance of 90% is obtained for I<inf>0.5</inf>T<inf>0.5</inf>O films, hence can be used as highly transparent and conducting electrodes. © 2018 IOP Publishing Ltd.Absorption spectroscopyAlloyingConductive filmsCrystallinityEnergy dispersive spectroscopyEnergy gapIndium compoundsMorphologyOxide filmsScanning electron microscopySpray pyrolysisSurface morphologyTin oxidesTransparent electrodesX ray diffractionBand gap engineeringConducting electrodesElectrical conductivityEnergy dispersive X ray spectroscopyIndium tin oxide thin filmsOptical and electrical propertiesSpray-pyrolysis techniquesUV-visible absorption spectroscopyThin films