Please use this identifier to cite or link to this item: https://idr.nitk.ac.in/jspui/handle/123456789/8843
Full metadata record
DC FieldValueLanguage
dc.contributor.authorSanthosh, T.C.M.
dc.contributor.authorBangera, K.V.
dc.contributor.authorShivakumar, G.K.
dc.date.accessioned2020-03-30T10:22:51Z-
dc.date.available2020-03-30T10:22:51Z-
dc.date.issued2016
dc.identifier.citationMaterials Today: Proceedings, 2016, Vol.3, 6, pp.2220-2224en_US
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/8843-
dc.description.abstractCadmium selenide is a direct band gap material which finds applications in optoelectronic devices. Preparation of the compound semiconductor in thin film form with stable electrical characterization has been investigated in the present study. As deposited films at room temperature (25�C) are non-stoichiometric with excess cadmium and films grown at 180�C substrate temperature are stoichiometric and homogeneous. The crystallinity increases with increase in substrate temperature. The optical band gap determined from absorption measurements lie in the range 1.89 eV - 2.02 eV. Electrical conductivity measurements made in a temperature range from 25�C to 200�C yield thermal activation energy of 0.52eV for stoichiometric films. Films deposited at 180� C and annealed at 200� C for two hours are found to be stabilized in its electrical and structural properties. � 2016 Elsevier Ltd.en_US
dc.titlePreparation of vacuum deposited cadmium selenide thin films for optoelectronic applicationsen_US
dc.typeBook chapteren_US
Appears in Collections:2. Conference Papers

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.