Please use this identifier to cite or link to this item:
https://idr.nitk.ac.in/jspui/handle/123456789/16919
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | National Institute of Technology Karnataka | - |
dc.date.accessioned | 2021-12-29T09:52:08Z | - |
dc.date.available | 2021-12-29T09:52:08Z | - |
dc.date.issued | 2020-09-24 | - |
dc.identifier.uri | http://idr.nitk.ac.in/jspui/handle/123456789/16919 | - |
dc.description | Date of Filing: 15/02/2017 Date of Grant: 24/09/2020 | en_US |
dc.language.iso | en | en_US |
dc.publisher | Indian Patent Office, Chennai | en_US |
dc.relation.ispartofseries | 347677; | - |
dc.subject | FABRICATION | en_US |
dc.subject | HIGH CONDUCTIVE METALLIC FILMS | en_US |
dc.title | FABRICATION OF HIGH CONDUCTIVE METALLIC FILMS AT LOW TEMPERATURE | en_US |
dc.type | Other | en_US |
Appears in Collections: | 6. Patents Granted |
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