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dc.contributor.authorUdayashankar, N.K.-
dc.contributor.authorBhat, H.L.-
dc.identifier.citationBulletin of Materials Science, 2003, Vol.26, 7, pp.685-692en_US
dc.description.abstractUnintentionally doped homoepitaxial InSb films have been grown by liquid phase epitaxy employing ramp cooling and step cooling growth modes. The effect of growth temperature, degree of supercooling and growth duration on the surface morphology and crystallinity were investigated. The major surface features of the grown film like terracing, inclusions, meniscus lines, etc are presented step-by-step and a variety of methods devised to overcome such undesirable features are described in sufficient detail. The optimization of growth parameters have led to the growth of smooth and continuous films. From the detailed morphological, X-ray diffraction, scanning electron microscopic and Raman studies, a correlation between the surface morphology and crystallinity has been established.en_US
dc.titleInfluence of growth parameters on the surface morphology and crystallinity of InSb epilayers grown by liquid phase epitaxyen_US
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