Improvement of third-order NLO properties of vacuum deposited Cd1-xPbxS nanostructured thin films for optoelectronic device applications

dc.contributor.authorBairy, R.
dc.contributor.authorVijeth, H.
dc.contributor.authorKulkarni, S.D.
dc.contributor.authorMurari, M.S.
dc.contributor.authorBhat K, U.K.
dc.date.accessioned2026-02-04T12:26:37Z
dc.date.issued2023
dc.description.abstractA polycrystalline nanostructured cadmium lead sulfide thin film was deposited using the thermal evaporation (PVD) technique (Cd<inf>1-x</inf>Pb<inf>x</inf>S with x = 0.00, 0.01, 0.05 and 0.1 wt.% of Pb). Structural parameters of as-prepared Cd<inf>1-x</inf>Pb<inf>x</inf>S thin films have been studied through X-ray diffraction. The optical investigation demonstrates that Cd<inf>1-x</inf>Pb<inf>x</inf>S film's optical band gap (E<inf>g</inf>) may be adjusted from the visible to the near-infrared region. (2.64 - 2.42 eV). The film is substantially more appropriate for absorbing layers in solar cells and optoelectronic applications due to the large decrease in ‘E<inf>g</inf>.’ The enhanced Pb doping was found to have altered the surface morphology, verified by Field Emission Scanning Electron Microscopy (FESEM) images. The doped films also showed a significant red shift in the band edge and increased transmittance in the visible and NIR regions. The third-order nonlinear optical (TONLO) parameters of the samples were determined from the Q-switched Nd: YAG laser with 65-ps pulse duration at 1064 nm. The investigated TONLO components such as nonlinear absorption coefficient (β), nonlinear refractive index (n<inf>2</inf>) and the susceptibility χ(3)were found to be in the range from 1.16 × 10−3 to 4.12 × 10−3 (cmW−1), 1.06 × 10−8 to 3.32 × 10−8 (cm2 W−1) and 1.23 × 10−4 to 5.62 × 10−4 (esu) respectively. The results indicate that Pb-doping on CdS nanostructures on surface morphology can be used to modify NLO characteristics.Cd<inf>1-x</inf>Pb<inf>x</inf>S thin film is a potential and able material for optoelectronic device applications, as seen by these encouraging NLO results. © 2023 Elsevier Ltd
dc.identifier.citationMaterials Research Bulletin, 2023, 161, , pp. -
dc.identifier.issn255408
dc.identifier.urihttps://doi.org/10.1016/j.materresbull.2023.112146
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/21914
dc.publisherElsevier Ltd
dc.subjectBlue shift
dc.subjectCadmium sulfide
dc.subjectEnergy gap
dc.subjectField emission microscopes
dc.subjectII-VI semiconductors
dc.subjectImage enhancement
dc.subjectInfrared devices
dc.subjectLead compounds
dc.subjectMorphology
dc.subjectNanostructures
dc.subjectNeodymium lasers
dc.subjectNonlinear optics
dc.subjectOptoelectronic devices
dc.subjectPhotocatalytic activity
dc.subjectRed Shift
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSemiconductor doping
dc.subjectThermal evaporation
dc.subjectThin films
dc.subjectYttrium aluminum garnet
dc.subjectCd1-xpbxS thin film
dc.subjectDevice application
dc.subjectNLO
dc.subjectOptoelectronics devices
dc.subjectPb doping
dc.subjectPVD technique
dc.subjectS thin films
dc.subjectThird order
dc.subjectThird-order nonlinear optical
dc.subjectZ-scan
dc.subjectSurface morphology
dc.titleImprovement of third-order NLO properties of vacuum deposited Cd1-xPbxS nanostructured thin films for optoelectronic device applications

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