FABRICATION OF HIGH CONDUCTIVE METALLIC FILMS AT LOW TEMPERATURE

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dc.contributor.authorNational Institute of Technology Karnataka
dc.date.accessioned2021-12-29T09:52:08Z
dc.date.available2021-12-29T09:52:08Z
dc.date.issued2020-09-24
dc.descriptionDate of Filing: 15/02/2017 Date of Grant: 24/09/2020en_US
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/16919
dc.language.isoenen_US
dc.publisherIndian Patent Office, Chennaien_US
dc.relation.ispartofseries347677;
dc.subjectFABRICATIONen_US
dc.subjectHIGH CONDUCTIVE METALLIC FILMSen_US
dc.titleFABRICATION OF HIGH CONDUCTIVE METALLIC FILMS AT LOW TEMPERATUREen_US
dc.typeOtheren_US

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