Characterization of thin film Al/p-CdTe schottky diode

dc.contributor.authorMahesha, M.G.
dc.contributor.authorKasturi, V.B.
dc.contributor.authorShivakumar, G.K.
dc.date.accessioned2020-03-31T08:18:43Z
dc.date.available2020-03-31T08:18:43Z
dc.date.issued2008
dc.description.abstractA study has been made on the behavior of Al/p-CdTe thin film junction grown by thermal evaporation method. I-V characteristics show that the Al makes Schottky contact with p-CdTe. The variation of junction capacitance with frequency and voltage has been studied to evaluate the barrier height. The activation energy and band gap have been estimated by studying variation of resistivity with temperature. Using all these data, band diagram of Al/p-CdTe has been proposed. T B?TAK.en_US
dc.identifier.citationTurkish Journal of Physics, 2008, Vol.32, 3, pp.151-156en_US
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/10200
dc.titleCharacterization of thin film Al/p-CdTe schottky diodeen_US
dc.typeArticleen_US

Files

Original bundle

Now showing 1 - 1 of 1
Thumbnail Image
Name:
10200.pdf
Size:
174.66 KB
Format:
Adobe Portable Document Format