Synthesis, Characterization and Laser Patterning of Pulsed DC Magnetron Sputtered NiTi Shape Memory Alloy and TiN Thin in Films
Date
2023
Authors
M. A., Jithin
Journal Title
Journal ISSN
Volume Title
Publisher
National Institute Of Technology Karnataka Surathkal
Abstract
The preparation, characterization, and applications of nickel-titanium (NiTi) shape
memory alloy (SMA) and titanium nitride (TiN) thin films are investigated in this
thesis. The vacuum diagnoses of the process chamber using a residual gas analyzer
(RGA) and its importance in the high-quality thin film process environment have been
discussed. An optical emission spectroscope has been employed for analyzing the in-
situ plasma characteristics of both pulsed DC magnetron sputter (PDCMS) deposition
technique and the conventional DC magnetron sputter deposition (DCMS) techniques.
The PDCMS NiTi plasmas exhibited higher intensity than the DCMS NiTi plasmas.
The enhancements of the NiTi plasma and thin film properties of the PDCMS
deposition technique over those of the conventional DCMS technique have been
investigated. In the next attempt, the influence of deposition pressure and pulse
frequencies on the NiTi thin films properties has been investigated. The NiTi films
deposited at 10-3 mbar order pressure exhibited austenitic phase at room temperature,
whereas the NiTi films deposited at 10-2 mbar order were in martensitic phase at room
temperature. The NiTi films deposited at various pulse frequencies (50 to 350 kHz)
did not significantly improve the film properties because the variation of pulse
frequencies from 50 to 350 kHz was not adequate to impact the film properties
substantially. The second material, TiN, has also been synthesized using the PDCMS
technique. The electrical properties of the TiN thin films have been fine-tuned by
varying their microstructures using various process adjustments like substrate
temperature and nitrogen partial pressures. The TiN film with better electrical
resistivity was chosen to fabricate micro-heaters. Focused Ion Beam (FIB) and
Ytterbium fiber laser bulk micromachining techniques were utilized to fabricate the
micro-heater patterns. By adjusting the input powers, the temperature attained was
nearly 400 °C. Similarly, femtosecond laser and Ytterbium fiber laser bulk
micromachining techniques were used to fabricate NiTi micro-devices, such as micro-
cantilevers and micro-wrappers micro-combs, micro-mesh, etc. TiN micro-heaters
were fabricated alongside the NiTi micro-devices to provide the required temperatures
for actuation. Since both NiTi and TiN are biocompatible materials, these devices
could be used in bio-friendly environments.
Description
Keywords
DC magnetron sputtering, Pulsed DC magnetron sputtering, Nickel- Titanium, Titanium nitride