The role of cobalt doping in tuning the band gap, surface morphology and third-order optical nonlinearities of ZnO nanostructures for NLO device applications

dc.contributor.authorBairy, R.
dc.contributor.authorPatil, P.S.
dc.contributor.authorMaidur, S.R.
dc.contributor.authorVijeth, H.
dc.contributor.authorMurari, M.S.
dc.contributor.authorBhat K, U.K.
dc.date.accessioned2026-02-05T09:30:38Z
dc.date.issued2019
dc.description.abstractThe work presented here reported the effect of doping cobalt (Co) in ZnO thin films. The thin films were prepared using the spray pyrolysis technique with 0, 1, 5 and 10 wt% cobalt doping concentrations to study the morphological, optical and third-order nonlinear optical (NLO) properties. X-ray diffraction revealed the crystalline nature of the prepared thin films, and the crystallite size was found to increase with the concentration of doped Co. The morphology and surface topography of the films were largely influenced by doping, as indicated by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). With an increase in Co-doping concentration, the direct optical energy band-gap value increased from 3.21 eV to 3.45 eV for pure to 10 at% of Co concentrations respectively. To study the NLO properties of the prepared thin films, the Z-scan technique was adopted; it was observed that with an increase in the doping concentration from 0 to 10 wt%, the nonlinear absorption coefficient (?) was enhanced from 4.68 × 10-3 to 9.92 × 10-3 (cm W-1), the nonlinear refractive index (n<inf>2</inf>) increased from 1.37 × 10-8 to 2.90 × 10-8 (cm2 W-1), and the third-order NLO susceptibility (?(3)) values also increased from 0.79 × 10-6 to 1.88 × 10-6 (esu). At the experimental wavelength, the optical limiting (OL) features of the prepared films were explored, and the limiting thresholds were calculated. The encouraging results of the NLO studies suggest that the Co:ZnO thin film is a capable and promising material for nonlinear optical devices and optical power limiting applications. © 2019 The Royal Society of Chemistry.
dc.identifier.citationRSC Advances, 2019, 9, 39, pp. 22302-22312
dc.identifier.urihttps://doi.org/10.1039/c9ra03006a
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/24800
dc.publisherRoyal Society of Chemistry
dc.subjectAtomic force microscopy
dc.subjectCobalt
dc.subjectCrystallite size
dc.subjectEnergy gap
dc.subjectField emission microscopes
dc.subjectFilm preparation
dc.subjectII-VI semiconductors
dc.subjectMetallic films
dc.subjectOptical films
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSemiconductor doping
dc.subjectSpray pyrolysis
dc.subjectSurface morphology
dc.subjectThin films
dc.subjectTopography
dc.subjectZinc oxide
dc.subjectField emission scanning electron microscopy
dc.subjectNonlinear absorption coefficient
dc.subjectNonlinear optical devices
dc.subjectNonlinear refractive index
dc.subjectOptical energy band gap
dc.subjectSpray-pyrolysis techniques
dc.subjectThird-order nonlinear optical
dc.subjectThird-order optical nonlinearities
dc.subjectNonlinear optics
dc.titleThe role of cobalt doping in tuning the band gap, surface morphology and third-order optical nonlinearities of ZnO nanostructures for NLO device applications

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