Fabrication of high conductive metallic films at low temperature

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dc.contributor.authorMandal, Saumen
dc.contributor.authorGupta, Bikesh
dc.contributor.authorPujar, Pavan
dc.contributor.authorHadagalli, Komalakrishna
dc.contributor.authorVivek V, Robbi
dc.date.accessioned2022-01-15T06:45:25Z
dc.date.available2022-01-15T06:45:25Z
dc.date.issued2018-08-17
dc.descriptionPatent Published Date: 17.08.2018en_US
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/16964
dc.language.isoenen_US
dc.publisherIndian Patent Office, Chennaien_US
dc.relation.ispartofseries201741005384;
dc.subjectFabrication of high conductive metallic filmsen_US
dc.subjectLow temperatureen_US
dc.titleFabrication of high conductive metallic films at low temperatureen_US
dc.typeOtheren_US

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