Conduction mechanisms in vacuum deposited p-ZnTe/n-Si heterojunction diodes

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Date

2011

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Abstract

p-ZnTe/n-Si heterojunction diodes were prepared by vacuum depositing ZnTe films on n-Si substrates. Detailed electrical characterization was performed to determine the conduction mechanisms operating in the diode. Important parameters such as ideality factor and barrier height were also determined. © 2011 American Institute of Physics.

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Keywords

Heterojunction, -VI Semiconductor, Thin Film, Vacuum Deposition, Zinc Telluride

Citation

AIP Conference Proceedings, 2011, Vol.1349, PART A, p. 601-602

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