An Ultra-low Noise, Highly Compact Implantable 28 nm CMOS Neural Recording Amplifier
| dc.contributor.author | Akuri, N.G. | |
| dc.contributor.author | Naik, D.N. | |
| dc.contributor.author | Kumar, S. | |
| dc.contributor.author | Song, H. | |
| dc.contributor.author | Kar, A. | |
| dc.date.accessioned | 2026-02-04T12:24:38Z | |
| dc.date.issued | 2024 | |
| dc.description.abstract | An ultra-low noise, Tera-ohm input impedance two-stage front-end neural amplifier (FENA) in the 28 nm CMOS process is presented in this work. As per the author’s best knowledge, the proposed FENA is implemented on a 28 nm CMOS process for the first time. The proposed FENA consists of an operational transconductance amplifier integrated low-pass filter (LPF) technique. This technique effectively removes the noise current density by using the LPF transfer function and FENA circuit to achieve the best performances, such as ultra-low input-referred noise, ultra-high input impedance, and high gain. The proposed mathematical technique is employed to optimize the dimensions of the neural amplifier in the 28 nm lower node, which results in a noise-free biasing current and ultra-low input referred noise of 18 fV/√Hz at 10 KHz. The ultra-low input referred noise of FENA is achieved by reducing the gate-distributed resistance method. The FENA achieves an ultra-high input impedance of 0.2 Tera-ohm, while a splendid measured gain of 60 dB has succeeded. FENA occupies a chip area of 0.0023 mm2, which consumes a lower power consumption of 1 µW under supply voltage of 1.2 V. The FENA is found to be less prone to PVT variations as 1 mHz of high-pass corner frequency towards robust design. The best performance parameters of FENA could be beneficial for deep exploration neural recording in wireless neural monitoring systems. © 2024, Institute of Electronics Engineers of Korea. All rights reserved. | |
| dc.identifier.citation | Journal of Semiconductor Technology and Science, 2024, 24, 3, pp. 270-283 | |
| dc.identifier.issn | 15981657 | |
| dc.identifier.uri | https://doi.org/10.5573/JSTS.2024.24.3.270 | |
| dc.identifier.uri | https://idr.nitk.ac.in/handle/123456789/21065 | |
| dc.publisher | Institute of Electronics Engineers of Korea | |
| dc.subject | CMOS integrated circuits | |
| dc.subject | Electric impedance | |
| dc.subject | Electric impedance measurement | |
| dc.subject | MOS devices | |
| dc.subject | Neurophysiology | |
| dc.subject | Operational amplifiers | |
| dc.subject | Oxide semiconductors | |
| dc.subject | Bio-medical | |
| dc.subject | Complementary metal oxide semiconductor | |
| dc.subject | Complementary metal oxide semiconductor process | |
| dc.subject | Complementary metal oxide semiconductors | |
| dc.subject | Front end | |
| dc.subject | Front-end amplifier | |
| dc.subject | Low-pass filters | |
| dc.subject | Neural recordings | |
| dc.subject | Neural systems | |
| dc.subject | Ultra low noise | |
| dc.subject | Low pass filters | |
| dc.title | An Ultra-low Noise, Highly Compact Implantable 28 nm CMOS Neural Recording Amplifier |
