Detection of acceptor-bound exciton peak at 300 K in boron–phosphorus co-doped ZnMgO thin films for room-temperature optoelectronics applications

dc.contributor.authorSushama, S.
dc.contributor.authorMurkute, P.
dc.contributor.authorGhadi, H.
dc.contributor.authorPandey, S.K.
dc.contributor.authorChakrabarti, S.
dc.date.accessioned2026-02-05T09:27:44Z
dc.date.issued2021
dc.description.abstractIt is well-known that the ZnMgO thin-film faces a roadblock in its potential applications for various optoelectronic devices due to the limitation imposed on achieving p-type conduction. The mono-acceptor doping of ZnMgO endures from the stern self-compensation by native donor defects and deep acceptor level formation advocating the need for alternate doping techniques like co-doping. In this paper, we report a detailed study on the improvement in structural, elemental, and optical properties of phosphorus-doped Zn<inf>0.85</inf>Mg<inf>0.15</inf>O thin films, with an aim to obtain enhancement in the signatures of acceptor-doped behavior, under the influence of boron implantation time. In addition, the paper also captures the behavior exhibited by the co-doped samples as a result of the variation in the annealing temperature. The solubility of the phosphorus atom (acceptor dopant) was observed to improve with boron (donor co-dopant) implantation as confirmed by the structural, elemental, and optical properties of co-doped ZnMgO thin films. It was also found that the acceptor level emissions got improved after boron implantation in phosphorus-doped ZnMgO thin films. Additionally, with co-doping, the sample showed the signature of acceptor-bound exciton peak till 300 K, evidencing the room-temperature operability of the films. Moreover, the fabricated film had a shallow acceptor energy level located at around 74 ± 0.45 meV above the valence band. Co-doped samples also showed stable acceptor based optical emission for more than a year. © 2020 Elsevier B.V.
dc.identifier.citationOptical Materials, 2021, 111, , pp. -
dc.identifier.issn9253467
dc.identifier.urihttps://doi.org/10.1016/j.optmat.2020.110591
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/23506
dc.publisherElsevier B.V.
dc.subjectBoron
dc.subjectExcitons
dc.subjectMagnesium compounds
dc.subjectOptical properties
dc.subjectOptoelectronic devices
dc.subjectPhosphorus
dc.subjectSemiconductor doping
dc.subjectZinc compounds
dc.subjectAcceptor bound exciton
dc.subjectAcceptor dopants
dc.subjectAnnealing temperatures
dc.subjectBoron implantation
dc.subjectDoping techniques
dc.subjectOptical emissions
dc.subjectP-Type conduction
dc.subjectSelf compensation
dc.subjectThin films
dc.titleDetection of acceptor-bound exciton peak at 300 K in boron–phosphorus co-doped ZnMgO thin films for room-temperature optoelectronics applications

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