Performance and analysis of temperature dependent multi-walled carbon nanotubes as global interconnects at different technology nodes

dc.contributor.authorSandha, K.
dc.contributor.authorRaj, B.
dc.date.accessioned2026-02-05T09:33:42Z
dc.date.issued2015
dc.description.abstractA temperature dependent performance in terms of power delay product (PDP) of multi-walled carbon nanotube (MWCNT) bundle interconnect has been analyzed for temperature range from 200 to 450 K at three different technology nodes viz. 32, 22 and 16nm. A similar analysis is performed for copper interconnect and results are compared with MWCNT bundle interconnect. Comparative results revealed that delay and PDP is increased with rise in temperature ranging from 200 to 450 K. It has also been observed that the temperature dependent MWCNT bundle interconnect gives better performance in terms of delay, power and PDP as compared to copper interconnect for three technology nodes at global interconnect length. © 2015, Springer Science+Business Media New York.
dc.identifier.citationJournal of Computational Electronics, 2015, 14, 2, pp. 469-476
dc.identifier.issn15698025
dc.identifier.urihttps://doi.org/10.1007/s10825-015-0667-3
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/26271
dc.publisherKluwer Academic Publishers barbara.b.bertram@gsk.com
dc.subjectCarbon
dc.subjectCopper
dc.subjectIntegrated circuit interconnects
dc.subjectYarn
dc.subjectBetter performance
dc.subjectCopper interconnects
dc.subjectGlobal interconnects
dc.subjectInterconnect
dc.subjectMean free path
dc.subjectPower delay product
dc.subjectTemperature dependent
dc.subjectTemperature range
dc.subjectMultiwalled carbon nanotubes (MWCN)
dc.titlePerformance and analysis of temperature dependent multi-walled carbon nanotubes as global interconnects at different technology nodes

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