Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices

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dc.contributor.authorM.a, M.A.
dc.contributor.authorLakshmi Ganapathi, L.G.
dc.contributor.authorG N V R, V.
dc.contributor.authorUdayashankar, N.K.
dc.contributor.authorMohan, S.
dc.date.accessioned2026-02-05T09:31:29Z
dc.date.issued2018
dc.description.abstractTitanium nitride (TiN) thin films are deposited on Si/SiO<inf>2</inf> substratesby using Pulsed DC magnetron sputtering and are characterized for their structural, mechanical and electrical properties for their application as localized heating elements in microsystem devices. The influence of substrate temperature on the properties of TiN films has been investigated. The correlation between the structural orientation with mechanical and electrical properties has been established. The films deposited at a substrate temperature of 300 °C have shown better structural, mechanical and electrical properties. This film has been chosen for the fabrication of microheater and its characterization. A maximum temperature of 250 °C is achieved by applying a power of 2.8 W to the microheater. © 2018 Elsevier B.V.
dc.identifier.citationSensors and Actuators A: Physical, 2018, 272, , pp. 199-205
dc.identifier.issn9244247
dc.identifier.urihttps://doi.org/10.1016/j.sna.2017.12.066
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/25199
dc.publisherElsevier B.V.
dc.subjectElectric conductivity
dc.subjectHeating equipment
dc.subjectMagnetron sputtering
dc.subjectMicroelectromechanical devices
dc.subjectNitrides
dc.subjectSilicon compounds
dc.subjectThin film circuits
dc.subjectTitanium
dc.subjectTitanium compounds
dc.subjectTitanium nitride
dc.subjectMechanical and electrical properties
dc.subjectMicroheater
dc.subjectMicrosystem devices
dc.subjectPulsed DC magnetron
dc.subjectPulsed DC magnetron sputtering
dc.subjectStructural orientations
dc.subjectSubstrate temperature
dc.subjectTitanium nitride thin films
dc.subjectThin films
dc.titlePulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices

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