Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive

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dc.contributor.authorSinghal, R.
dc.contributor.authorSatyanarayan, M.N.
dc.contributor.authorPal, S.
dc.date.accessioned2026-02-05T09:35:45Z
dc.date.issued2011
dc.description.abstractWe present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ?2 to 2.4 ?m and height ?1.8 to 2.2 ?m are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ?11 dB (TE<inf>00</inf>) and ?12 dB (TM00) for 2-cm waveguide at 1550 nm. © 2011 Society of Photo-Optical Instrumentation Engineers (SPIE).
dc.identifier.citationOptical Engineering, 2011, 50, 9, pp. -
dc.identifier.issn913286
dc.identifier.urihttps://doi.org/10.1117/1.3622758
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/27190
dc.subject1550 nm
dc.subjectChannel waveguide
dc.subjectChip-level
dc.subjectCross-linkable
dc.subjectNegative tones
dc.subjectOptical adhesive
dc.subjectPhotosensitive polymers
dc.subjectPolymer waveguide
dc.subjectUltra-violet
dc.subjectUltraviolet lithography
dc.subjectLight sensitive materials
dc.subjectPhotolithography
dc.subjectPhotosensitivity
dc.subjectPlasma filled waveguides
dc.subjectPolymers
dc.subjectWaveguides
dc.titleFabrication of monomode channel waveguides in photosensitive polymer on optical adhesive

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