Structure and properties of vacuum deposited cadmium telluride thin films

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dc.contributor.authorShreekanthan, K.N.
dc.contributor.authorBangera, K.V.
dc.contributor.authorShivakumar, G.K.
dc.contributor.authorMahesha, M.G.
dc.date.accessioned2020-03-31T08:45:13Z
dc.date.available2020-03-31T08:45:13Z
dc.date.issued2006
dc.description.abstractSystematic and detailed study of the growth and properties of vacuum deposited cadmium telluride thin films was made. Both p- and n-type films were grown and these films were characterized for their structural, optical, and electrical properties. The crystallographic structure of the deposits was found to be dependent on the rate of deposition. Low deposition rates were observed to result in hexagonal deposits whereas high rates of deposition favoured cubic structure for the film. Electrical and optical properties were also found to be dependent on the deposition parameters.en_US
dc.identifier.citationIndian Journal of Pure and Applied Physics, 2006, Vol.44, 9, pp.705-708en_US
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/13075
dc.titleStructure and properties of vacuum deposited cadmium telluride thin filmsen_US
dc.typeArticleen_US

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