Spreading behavior and evolution of IMCs during reactive wetting of SAC solders on smooth and rough copper substrates

dc.contributor.authorSatyanarayan, S.
dc.contributor.authorPrabhu, K.
dc.date.accessioned2026-02-05T09:34:43Z
dc.date.issued2013
dc.description.abstractThe effect of surface roughness of copper substrate on the reactive wetting of Sn-Ag-Cu solder alloys and morphology of intermetallic compounds (IMCs) was investigated. The spreading behavior of solder alloys on smooth and rough Cu substrates was categorized into capillary, diffusion/reaction, and contact angle stabilization zones. The increase in substrate surface roughness improved the wetting of solder alloys, being attributed to the presence of thick Cu <inf>3</inf>Sn IMC at the interface. The morphology of IMCs transformed from long needle shaped to short protruded type with an increase in the substrate surface roughness for the Sn-0.3Ag-0.7Cu and Sn-3Ag-0.5Cu solder alloys. However, for the Sn-2.5Ag-0.5Cu solder alloy the needle-shaped IMCs transformed to the completely scallop type with increase in the substrate surface roughness. The effect of Ag content on wetting behavior was not significant. © 2013 TMS.
dc.identifier.citationJournal of Electronic Materials, 2013, 42, 8, pp. 2696-2707
dc.identifier.issn3615235
dc.identifier.urihttps://doi.org/10.1007/s11664-013-2619-7
dc.identifier.urihttps://idr.nitk.ac.in/handle/123456789/26747
dc.subjectAngle stabilization
dc.subjectCopper substrates
dc.subjectIMC
dc.subjectLead free solders
dc.subjectReactive wetting
dc.subjectSn-Ag-Cu solder alloys
dc.subjectSubstrate surface
dc.subjectWetting behavior
dc.subjectAlloys
dc.subjectContact angle
dc.subjectCopper
dc.subjectCopper alloys
dc.subjectCopper compounds
dc.subjectMorphology
dc.subjectNeedles
dc.subjectSilver
dc.subjectSilver alloys
dc.subjectSoldering alloys
dc.subjectSubstrates
dc.subjectSurface roughness
dc.subjectTin alloys
dc.subjectWetting
dc.subjectTin
dc.titleSpreading behavior and evolution of IMCs during reactive wetting of SAC solders on smooth and rough copper substrates

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