Faculty Publications
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Item Room-temperature ultraviolet-ozone annealing of ZnO and ZnMgO nanorods to attain enhanced optical properties(Springer, 2020) Alam, M.J.; Murkute, P.; Sushama, S.; Ghadi, H.; Mondal, S.; Paul, S.; Das, D.; Pandey, S.K.; Chakrabarti, S.ZnO and ZnMgO nanorods have proven to be promising materials for sensing, UV and deep UV based optoelectronic applications. A major drawback of ZnO and ZnMgO based thin films and nanorods is the presence of native point defects which deteriorates their optical efficiency and becomes an impediment to their efficient device applications. The furnace and rapid thermal annealing processes have overcome this up to a great extent but being high temperature processes, they put many fabrication and technological limits in device fabrication. Especially keeping an eye on the future flexible devices, herein we report ultraviolet-ozone (UVO) annealing as a room-temperature, simple and cost-effective annealing method to improve the optical efficiency of ZnO and ZnMgO nanorods along with control of defect states. The ZnO and ZnMgO nanorods were grown by hydrothermal method and annealed in UVO irradiation. UVO annealing substantially improved near band emission and suppressed defect band emissions. It is found that zinc interstitial atoms migrate from the top portion of ZnO nanorods towards the bottom of nanorods after UVO annealing, resulting in reduced zinc interstitial defects in the top portion of nanorods. X-ray diffraction results showed improvement in structural properties. XPS results confirmed suppression of oxygen vacancies and zinc interstitials and improvement in lattice oxygen in the ZnO nanorods after UVO annealing. Optimum times of UVO annealing for ZnO and ZnMgO nanorods were 30 and 50 min respectively. These findings will be helpful for the further development of ZnO and ZnMgO nanorods based high performance optoelectronic devices and sensors. © 2020, Springer Science+Business Media, LLC, part of Springer Nature.Item Phosphorus doping of ZnO using spin-on dopant process: A better choice than costly and destructive ion-implantation technique(Elsevier B.V., 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Radio frequency sputtered ZnO thin films doped with phosphorus (ZnO:P) have been prepared employing spin-on dopant process. In the SOD process, the dopant film has been spin-coated on a silicon substrate and positioned close to the as-deposited undoped ZnO film at high temperature to perform the phosphorus doping. The high-resolution X-ray diffraction measurement reveals that the prepared ZnO:P films are good in crystalline quality which improves further by annealing. It is found that the full-width half-maximum corresponding to (002) peak of SOD processed thin films is much narrower than previously reported ion-implanted thin films, indicating the better crystalline quality of SOD processed phosphorus-doped ZnO thin films. The X-ray photoelectron spectroscopy measurement signifies that the P2O5 decomposes into two phosphorus atoms behaving like an acceptor dopant and five oxygen atoms which may fill in oxygen vacancies at high-temperature annealing. The photoluminescence spectra discover the acceptor bound exciton peak at 3.35 eV and free electron to acceptor level transitions at 3.31 eV. The calculated acceptor binding energy is 127 meV for the phosphorus dopant which works as a shallow acceptor level. It is found that the phosphorus-doped ZnO thin films prepared using the SOD process have much superior structural and optical properties in comparison to previously reported ion-implanted film. This study demonstrates that the SOD process is much superior than the ion-implantation process to produce high-quality ZnO:P thin films for very stable p-type conduction. © 2021 Elsevier B.V.Item Enhancement in structural, elemental and optical properties of boron–phosphorus Co-doped ZnO thin films by high-temperature annealing(Elsevier B.V., 2021) Sushama, S.; Murkute, P.; Ghadi, H.; Pandey, S.K.; Chakrabarti, S.The inherent n-type nature of zinc oxide (ZnO) and its unstable p-type behavior with single dopant species have encouraged researchers to explore the effect of multiple dopants as a viable solution for long-term stability and repeatability. Herein, we report boron (B) and phosphorus (P) co-doped ZnO thin films engineered through an optimized ion implantation technique followed by annealing at 1000 °C in oxygen ambiance. We investigated their structural, chemical, and optical properties to capture the effect of both boron implantation duration and annealing temperature. Co-doping with boron was observed to boost phosphorus incorporation in the film. Compared with P-doping, P–B co-doping increased the dominance of acceptor-bound exciton peak and also, suppressed non-radiative/visible emission which is due to reduced Madelung energy. After high-temperature annealing at 1000 °C, further narrowing of optical emission peaks generated due to acceptor incorporation was observed. Also, the co-doped samples showed stability in the acceptor behavior for more than one year. © 2021 Elsevier B.V.