Faculty Publications
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Item Detection of acceptor-bound exciton peak at 300 K in boron–phosphorus co-doped ZnMgO thin films for room-temperature optoelectronics applications(Elsevier B.V., 2021) Sushama, S.; Murkute, P.; Ghadi, H.; Pandey, S.K.; Chakrabarti, S.It is well-known that the ZnMgO thin-film faces a roadblock in its potential applications for various optoelectronic devices due to the limitation imposed on achieving p-type conduction. The mono-acceptor doping of ZnMgO endures from the stern self-compensation by native donor defects and deep acceptor level formation advocating the need for alternate doping techniques like co-doping. In this paper, we report a detailed study on the improvement in structural, elemental, and optical properties of phosphorus-doped Zn0.85Mg0.15O thin films, with an aim to obtain enhancement in the signatures of acceptor-doped behavior, under the influence of boron implantation time. In addition, the paper also captures the behavior exhibited by the co-doped samples as a result of the variation in the annealing temperature. The solubility of the phosphorus atom (acceptor dopant) was observed to improve with boron (donor co-dopant) implantation as confirmed by the structural, elemental, and optical properties of co-doped ZnMgO thin films. It was also found that the acceptor level emissions got improved after boron implantation in phosphorus-doped ZnMgO thin films. Additionally, with co-doping, the sample showed the signature of acceptor-bound exciton peak till 300 K, evidencing the room-temperature operability of the films. Moreover, the fabricated film had a shallow acceptor energy level located at around 74 ± 0.45 meV above the valence band. Co-doped samples also showed stable acceptor based optical emission for more than a year. © 2020 Elsevier B.V.Item Phosphorus doping of ZnO using spin-on dopant process: A better choice than costly and destructive ion-implantation technique(Elsevier B.V., 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Radio frequency sputtered ZnO thin films doped with phosphorus (ZnO:P) have been prepared employing spin-on dopant process. In the SOD process, the dopant film has been spin-coated on a silicon substrate and positioned close to the as-deposited undoped ZnO film at high temperature to perform the phosphorus doping. The high-resolution X-ray diffraction measurement reveals that the prepared ZnO:P films are good in crystalline quality which improves further by annealing. It is found that the full-width half-maximum corresponding to (002) peak of SOD processed thin films is much narrower than previously reported ion-implanted thin films, indicating the better crystalline quality of SOD processed phosphorus-doped ZnO thin films. The X-ray photoelectron spectroscopy measurement signifies that the P2O5 decomposes into two phosphorus atoms behaving like an acceptor dopant and five oxygen atoms which may fill in oxygen vacancies at high-temperature annealing. The photoluminescence spectra discover the acceptor bound exciton peak at 3.35 eV and free electron to acceptor level transitions at 3.31 eV. The calculated acceptor binding energy is 127 meV for the phosphorus dopant which works as a shallow acceptor level. It is found that the phosphorus-doped ZnO thin films prepared using the SOD process have much superior structural and optical properties in comparison to previously reported ion-implanted film. This study demonstrates that the SOD process is much superior than the ion-implantation process to produce high-quality ZnO:P thin films for very stable p-type conduction. © 2021 Elsevier B.V.Item Enhancement in structural, elemental and optical properties of boron–phosphorus Co-doped ZnO thin films by high-temperature annealing(Elsevier B.V., 2021) Sushama, S.; Murkute, P.; Ghadi, H.; Pandey, S.K.; Chakrabarti, S.The inherent n-type nature of zinc oxide (ZnO) and its unstable p-type behavior with single dopant species have encouraged researchers to explore the effect of multiple dopants as a viable solution for long-term stability and repeatability. Herein, we report boron (B) and phosphorus (P) co-doped ZnO thin films engineered through an optimized ion implantation technique followed by annealing at 1000 °C in oxygen ambiance. We investigated their structural, chemical, and optical properties to capture the effect of both boron implantation duration and annealing temperature. Co-doping with boron was observed to boost phosphorus incorporation in the film. Compared with P-doping, P–B co-doping increased the dominance of acceptor-bound exciton peak and also, suppressed non-radiative/visible emission which is due to reduced Madelung energy. After high-temperature annealing at 1000 °C, further narrowing of optical emission peaks generated due to acceptor incorporation was observed. Also, the co-doped samples showed stability in the acceptor behavior for more than one year. © 2021 Elsevier B.V.Item Unfolding the conductivity reversal n- to p-type in phosphorus-doped ZnO thin films by spin-on dopant (SOD) process(Institute of Physics, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; Chakrabarti, S.Phosphorus doping induced p-type doping in ZnO thin films based on spin-on dopant (SOD) process is reported in this article. Owing to the reduced dependence on the conventional amenities for diffusion/ion-implantation doping, the SOD process provides a simple and cheap doping method. The effect of SOD process temperature on conductivity ZnO thin films is investigated by altering the temperature from 700°C to 1000°C. Systematic field emission scanning electron microscopy analysis demonstrates the impact of doping temperature on the morphological properties of SOD. The x-ray diffraction measurements reveal that the p-type ZnO thin films had (002) preferred crystal orientation. At the same time, x-ray photoelectron spectroscopy validated the formation of the PZn-2VZn complex, which was responsible for the acceptor behaviour of films. Moreover, the photoluminescence spectra tracked down that the origin of 3.35 and 3.31 eV emission peaks is due to the acceptor bound exciton and free-electron to acceptor level transitions, respectively. Finally, an elevated hole concentration of 2.09 × 1016 cm-3 is achieved with a resistivity of 1.14 ω-cm at 800°C doping temperature. However, the film doped at 900°C and 1000°C showed n-type behaviour due to the generation of high concentration donor defects. Here, we successfully demonstrate that the SOD process has great potential to produce high-quality p-type ZnO thin films suitable for optoelectronic devices applications. © 2022 IOP Publishing Ltd.Item Investigation of phosphorus-doping of MgZnO thin films using efficient spin-on dopant process(Elsevier B.V., 2023) Mishra, M.; Saha, R.; Tyagi, L.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Phosphorus doped MgZnO thin films were prepared using the RF sputtering technique on a Si wafer, followed by spin-on doping (SOD) and annealing. The SOD is a cheap and non-destructive process in which the dopant film is spun on a Si wafer and placed in the vicinity of deposited undoped MgZnO thin film at a high temperature to perform doping. After doping, the MgZnO thin films were annealed at temperatures such as 700, 800, and 900°C, which significantly improved morphological, structural, and optical properties. The atomic force microscopy and scanning electron microscopy measurements revealed that phosphorus-doped MgZnO thin films annealed at 800–900°C have good morphology and large grains. X-ray diffraction spectra demonstrated the (002) orientation of MgZnO thin films. The photoluminescence spectra measured at 20 K demonstrated the acceptor bound exciton peak at 3.47 eV and acceptor binding energy of around 64.34 meV, indicating the formation of shallow acceptor levels by phosphorus doping of MgZnO thin films using the SOD process. In Raman spectroscopy measurement, the peak of E2high phonons mode of MgZnO wurtzite structure was observed around 436 cm−1. The FWHM value of this peak reduces with augmentation annealing temperature, demonstrating improvement in crystallinity. X-ray photoelectron spectroscopy measurement demonstrated the presence of phosphorus atoms in the SOD processed MgZnO thin films, which is again verified by Fourier-transform infrared spectroscopy measurement showing vibration modes of P–O bonds. It was observed that the different properties of SOD-prepared phosphorus-doped MgZnO films were superior to the film prepared using the alternate costly and destructive ion-implantation technique. These findings have revealed that high-quality phosphorus-doped p-type MgZnO thin films by the SOD process are very suitable for UV optoelectronic device applications. © 2023 Elsevier B.V.Item Effect of Introducing Defects and Doping on Different Properties of Monolayer MoS2(John Wiley and Sons Inc, 2023) Prajakta, K.; Vinturaj, V.P.; Singh, R.; Garg, V.; Pandey, S.K.; Pandey, S.K.Herein, the comprehensive study of different properties of undoped MoS2, MoS2 lattice with sulfur (S) and, molybdenum (Mo) vacancy, and MoS2 with substitutional doping of niobium (Nb), vanadium (V), and zinc (Zn) atoms is done. The density functional theory (DFT) is used and the electronic properties like density of states, band structure, electron density, and optical properties like dielectric function, optical conductivity, and refractive index are studied. It is observed that undoped MoS2 monolayer shows direct bandgap semiconductor characteristics with a bandgap of around 1.79 eV. P-type characteristics are observed for Nb-, V-, and Zn-doped MoS2 lattices. The real part and imaginary parts of all optical parameters along x and z directions for different MoS2 supercells are found to be anisotropic in nature up to a photon energy of almost 11 eV and thereafter they show nearly isotropic nature. Finally, it is found that the obtained properties of MoS2 monolayer as per literature are suitable for next-generation MOSFET application. © 2023 Wiley-VCH GmbH.Item Theoretical investigation of electronic and optical properties of doped and defective MoSe2 monolayers(Springer, 2023) Vinturaj, V.P.; Yadav, A.K.; Jasil, T.K.; Kiran, G.; Singh, R.; Singh, A.K.; Garg, V.; Pandey, S.K.In this work, we have investigated the various electronic and optical properties of undoped molybdenum diselenide (MoSe2) monolayer, such as band structure, density of states, electron density, dielectric function, refractive index, extinction coefficient, reflectivity and energy loss function using density functional theory. Additionally, substitutional doping using niobium (Nb) and manganese (Mn) atoms and introducing defects in undoped MoSe2 lattice were investigated to know the detailed effect of the same on its properties. It is found that the undoped MoSe2 monolayer demonstrates a direct energy bandgap of ~1.44 eV, which reduces after Mn, Nb doping and after introducing Mo, Se vacancy. The energy bandgap attains a very small value 0.2 eV after introducing Se vacancy defect in MoSe2 lattice. The extinction coefficient of MoSe2 monolayer demonstrates a significant increase from 1.79 to 2.66 a.u. after introducing the Mo vacancy in the undoped lattice. The variation of semiconductor to nearly semi-metallic character of MoSe2 by introducing defects makes it very suitable for the application in high-performance solar cells, photo-electrochemical cells, sensors and biosensor applications. © 2023, Indian Academy of Sciences.Item Optimization of Quantum Capacitance of Functionalized VS2 Monolayer Electrodes to Shrink Hybrid Supercapacitors for On-Chip Energy Sources(American Chemical Society, 2025) Yadav, A.K.; Thiyyakkandy, J.; Singh, R.; Das, P.P.; Ajith, K.M.; Pandey, S.K.Quantum capacitance (CQ) of the electrodes plays an important role in enhancing the performance of supercapacitors by directly affecting the overall capacitance. In this study, several approaches including doping, creating vacancy, and adsorption have been used to enhance the CQ of the vanadium disulfide (VS2) electrode using density functional theory calculation. The undoped VS2 monolayer shows a maximum CQ value of 20.19 ?F/cm2. After creating V-vacancy (Vv) in the VS2 monolayer lattice, the CQ value increased to 35.61 ?F/cm2, which is the highest among all doped and defective VS2 lattices at room temperature. When we use VS2 electrodes for supercapacitors, generally ion adsorption occurs at the electrode surface, showing the necessity to investigate the adsorption of alkali/alkaline atoms (Li, Na, K, and Mg) at the VS2 surface to know the change in different properties of the electrode. It is found that generally CQ reduces due to the adsorption of alkali/alkaline atoms at the surface, but the K-adsorption at S-vacancy (Vs) VS2 demonstrated the increment of CQ value from 21.75 to 35.32 ?F/cm2 at room temperature. Additionally, the variation of the adsorption distance of the K atom at the Vs-VS2 surface revealed an optimum distance of value 3.5 Å, indicating that the K atom (radius = 2.43 Å) stabilizes just above the VS2 surface. Moreover, augmentation in CQ was seen with a decrease in temperature and attained a value of 49.96 ?F/cm2 at 100 K. The calculated CQ and open-circuit voltage (OCV) duly confirmed that the K-adsorbed Vs-VS2 is a potential candidate for the anode of hybrid supercapacitors as it has a maximum CQ value at the positive side of the electrochemical potential and an average OCV value of +0.615 V. This study reveals that the CQ of the VS2 electrode can be increased to minimize the size of high-performance hybrid supercapacitors for its application as an on-chip energy source. © 2025 American Chemical Society.