Faculty Publications
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Item Doping of ZnMgO with phosphorus by spin-on dopant technique(SPIE, 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Zinc magnesium oxide is a ternary compound wide bandgap semiconductor. Incorporation of Mg into ZnO helps in increasing the of p-type conductivity by affecting the background n-type nature of ZnO. This is possible because Mg incorporation in ZnO elevates the conduction band edge which in turn increases the distance between the shallow donor level and conduction band minima, resulting increase of activation energy for background donor. In this work, we report Spin-on Dopant technique to dope phosphorus in Zn0.85Mg0.15O lattice. The undoped ZnMgO thin film (sample A) was deposited using RF sputtering. The SOD sample (sample B) was prepared using P509 spin on dopant and kept approximate 1cm above ZnMgO film at 600°C for four hours. The doped sample was annealed at temperature 700°C (sample C) in oxygen ambient to see the high temperature annealing effect on doping. In studies of high-resolution x-ray diffraction, a dominant (002) peak was observed in sample A, B, and C at 34.173°, 34.624°, and 34.638° respectively. The shifting of (002) peak at higher angle for doped samples indicates the phosphorus doping in film. The XPS spectra of phosphorus 2p peak are appears at ∼134 eV indicates the presence of P atoms as P-O bonds in ZnMgO lattice. The Donor-Acceptor pair (DAP) transition peak around 3.473eV and free Acceptor (AX°) peak around 3.588eV were found in photoluminescence spectra of sample B revels the phosphorus doping in ZnMgO. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.Item Improvement in optical and elemental properties of spin-on phosphorus doped ZnO film(SPIE, 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.SOD is a type of conventional doping technique where diffusion of dopant atom takes place from the liquid source to film by thermal annealing of sample. The study shows the SOD process is a cost effective, less destructive and an efficient way to dope ZnO film. We have doped ZnO films with phosphorus atom by simply annealing it in atmospheric furnace up to 600°C for 4 hrs. After in-situ annealing SOD process, sample has also been ex-situ annealed at 900°C in oxygen ambient for 10 secs. The elemental analysis of phosphorus 2p peak at 132.62 eV ensures the existence of P-O bond for doped sample which shows phosphorus replacing Zn and bonding with oxygen in to the lattice in order to make Pzn-2Vzn an acceptor complex. The doped samples showed the photoluminescence peak at 3.32eV and 3.35eV, which attributed to free electron to acceptor (FA) and acceptor-bound exciton (A0X) energy as an evidence of acceptor doping in ZnO film. The ex-situ annealing of doped sample further improves in passivation of deep level defects of film. All sample has (002) orientation, and a compressive stress to be found in the doped sample due to phosphorus replacing Zn, are confirmed by analysis of XRD results. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.Item Unfolding the conductivity reversal n- to p-type in phosphorus-doped ZnO thin films by spin-on dopant (SOD) process(Institute of Physics, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; Chakrabarti, S.Phosphorus doping induced p-type doping in ZnO thin films based on spin-on dopant (SOD) process is reported in this article. Owing to the reduced dependence on the conventional amenities for diffusion/ion-implantation doping, the SOD process provides a simple and cheap doping method. The effect of SOD process temperature on conductivity ZnO thin films is investigated by altering the temperature from 700°C to 1000°C. Systematic field emission scanning electron microscopy analysis demonstrates the impact of doping temperature on the morphological properties of SOD. The x-ray diffraction measurements reveal that the p-type ZnO thin films had (002) preferred crystal orientation. At the same time, x-ray photoelectron spectroscopy validated the formation of the PZn-2VZn complex, which was responsible for the acceptor behaviour of films. Moreover, the photoluminescence spectra tracked down that the origin of 3.35 and 3.31 eV emission peaks is due to the acceptor bound exciton and free-electron to acceptor level transitions, respectively. Finally, an elevated hole concentration of 2.09 × 1016 cm-3 is achieved with a resistivity of 1.14 ω-cm at 800°C doping temperature. However, the film doped at 900°C and 1000°C showed n-type behaviour due to the generation of high concentration donor defects. Here, we successfully demonstrate that the SOD process has great potential to produce high-quality p-type ZnO thin films suitable for optoelectronic devices applications. © 2022 IOP Publishing Ltd.