Faculty Publications
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Item Doping of ZnMgO with phosphorus by spin-on dopant technique(SPIE, 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Zinc magnesium oxide is a ternary compound wide bandgap semiconductor. Incorporation of Mg into ZnO helps in increasing the of p-type conductivity by affecting the background n-type nature of ZnO. This is possible because Mg incorporation in ZnO elevates the conduction band edge which in turn increases the distance between the shallow donor level and conduction band minima, resulting increase of activation energy for background donor. In this work, we report Spin-on Dopant technique to dope phosphorus in Zn0.85Mg0.15O lattice. The undoped ZnMgO thin film (sample A) was deposited using RF sputtering. The SOD sample (sample B) was prepared using P509 spin on dopant and kept approximate 1cm above ZnMgO film at 600°C for four hours. The doped sample was annealed at temperature 700°C (sample C) in oxygen ambient to see the high temperature annealing effect on doping. In studies of high-resolution x-ray diffraction, a dominant (002) peak was observed in sample A, B, and C at 34.173°, 34.624°, and 34.638° respectively. The shifting of (002) peak at higher angle for doped samples indicates the phosphorus doping in film. The XPS spectra of phosphorus 2p peak are appears at ∼134 eV indicates the presence of P atoms as P-O bonds in ZnMgO lattice. The Donor-Acceptor pair (DAP) transition peak around 3.473eV and free Acceptor (AX°) peak around 3.588eV were found in photoluminescence spectra of sample B revels the phosphorus doping in ZnMgO. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.Item Improvement in optical and elemental properties of spin-on phosphorus doped ZnO film(SPIE, 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.SOD is a type of conventional doping technique where diffusion of dopant atom takes place from the liquid source to film by thermal annealing of sample. The study shows the SOD process is a cost effective, less destructive and an efficient way to dope ZnO film. We have doped ZnO films with phosphorus atom by simply annealing it in atmospheric furnace up to 600°C for 4 hrs. After in-situ annealing SOD process, sample has also been ex-situ annealed at 900°C in oxygen ambient for 10 secs. The elemental analysis of phosphorus 2p peak at 132.62 eV ensures the existence of P-O bond for doped sample which shows phosphorus replacing Zn and bonding with oxygen in to the lattice in order to make Pzn-2Vzn an acceptor complex. The doped samples showed the photoluminescence peak at 3.32eV and 3.35eV, which attributed to free electron to acceptor (FA) and acceptor-bound exciton (A0X) energy as an evidence of acceptor doping in ZnO film. The ex-situ annealing of doped sample further improves in passivation of deep level defects of film. All sample has (002) orientation, and a compressive stress to be found in the doped sample due to phosphorus replacing Zn, are confirmed by analysis of XRD results. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.Item Effect of post-deposition annealing ambient on Gallium Oxide (Ga2O3) films(SPIE, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; Chakrabarti, S.Gallium Oxide (Ga2O3) is an emerging wideband semiconductor which can be utilize in solar-blind photodetector and high power electronics application. Having a large bandgap and high breakdown field makes Ga2O3 material suitable for these device applications. However, the physical and the optical properties of Ga2O3 can be tailored by changing the annealing ambient and temperature, and understanding how the annealing atmosphere can affect these properties is crucial for designing a next generation optoelectronic devices. Moreover, the presence of defects and impurities can also affect the device parameters. Thus, in this work, we have investigated the influence of post deposition annealing atmosphere on the morphological, structural, and optical properties of Ga2O3 films. The prepared samples were further went through thermal annealing at 800℃ for 30 mins in Nitrogen (N2), and Oxygen (O2) ambient to achieve β-phase of Ga2O3. The structural properties of all the samples were studied by Atomic force microscopy, and X-ray diffraction while the optical properties were studies by UV-Visible, and photoluminescence spectroscopy. We have found monoclinic β-phase in the polycrystalline annealed Ga2O3 samples. The optical band gap of films were increased after annealing and highest band gap is obtained to 5.44eV in N2 annealed sample as compared to as-deposited sample (4.56eV). A broad photoluminescence spectrum ranged from 350 to 480 nm was observed, which further deconvoluted in three peaks at around 378 nm, 399 nm, and 422 nm in as-deposited sample. The same peaks with broad photoluminescence spectrum was found to be blue shifted for annealed samples as compared to the as-deposited. This study will open a new direction in future deep-UV photodetector fabrication. © 2022 SPIE.Item Reduction of oxygen vacancy related defects in RF sputtered deposited ZnO films by impurity (Phosphorus) incorporation(SPIE, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; das Gupta, K.D.; Chakrabarti, S.ZnO is a fascinating wide gap (3.37 eV) semiconductor due to its tunable optical and electrical properties, which can be utilized for several nanodevices such as nanogenerators, photodetectors, sensors, lasers, and TFTs. In this study, we have investigated the effect of the incorporation of dopants on the native defects and corresponding optical properties of ZnO. We have prepared three samples for the current study and such samples are named samples Z-0, Z-1, and Z-2 for undoped ZnO film, undoped ZnO film annealed at 800°C, and phosphorus doped ZnO film by using spin-on dopant method at an elevated temperature of 800°C, respectively. The XRD results show a dominant peak along the (002) plane for all samples. The Room-temperature photoluminescence spectra reveal that the broad peak around 542 nm for sample Z-0 gradually shifts towards the UV region for samples Z-1 and Z-2 and appears around 509 nm and 413 nm, respectively. Significantly, such blue emission is associated with the transitions from oxygen vacancies to valence band or zinc interstitial to valance band. Also, relatively huge reductions in oxygen vacancies are observed in phosphorus doped ZnO films as compared with undoped and undoped-anneal films. Further, we have verified such reductions in oxygen vacancies with XPS O-1s spectra-related peaks (~531-532 eV) with high-temperature annealing and phosphorus doping. Therefore, such a type of oxygen vacancy reduction in ZnO films by cost-effective SOD doping technique is highly essential for developing several ZnObased functional devices. © 2022 SPIE.Item Temperature Induced Conductivity Reversal in ZnO Thin Films(SPIE, 2023) Mishra, M.; Bhowmick, S.; Saha, R.; Pandey, S.K.; Chakrabarti, S.ZnO is a fascinating large gap (3.37 eV) semiconductor, which exhibits intrinsically n-type conductive due to its native defects such as zinc interstitials and oxygen vacancies and such n-type related defects tend to compensate the p-type acceptor defects. However, the generation process of p-type defects is more challenging for developing a good quality homojunction optical device. Here we have studied the effect of ex-situ atmospheric annealing on conductivity of ZnO films. The ZnO films were deposited using RF sputtering on Si substrate temperature at 400°C substrate temperature and 2.2E-2 mbar gas pressure. The films were deposited in oxygen-rich ambient to achieve less oxygen vacancy defects in the film. The ex-situ atmospheric annealing is performed at higher temperature of 900 and 1000ºC. The effects of this post-deposition annealing on the electrical, structural, elemental and optical properties of ZnO thin films were investigated in detail. The X-ray Diffraction (XRD) results exhibited the hexagonal wurtzite structure (002) orientation. After annealing, the XRD peak is shifted at higher 2-thetha value, which indicates a reduction in lattice constant. Further, X-ray photoelectron spectroscopy (XPS) had been done and such XPS results confirmed that simultaneous generation of acceptor defects and reduction of oxygen vacancy related donor concentrations. The electrical properties of films were studied using hall measurement system. These electrical parameters were purposive to inspect the effect of ex-situ atmospheric annealing temperatures on conductivity of films. The Hall measurement confirmed that 1000ºC annealed films achieve p-type conductivity with high reproducibility and such p-type behavior exhibits high mobility. Thus, temperature induced conductivity reversal could be a potential and cost-effective technique to achieve highly stable p-type ZnO films. © 2023 SPIE.Item Assessment of water quality of river Ganga along ghats in Varanasi city, U. P., India(2011) Thomas, T.; Mishra, M.; Thomas, H.; David, A.A.; Bharose, R.; Venkat Reddy, D.Assessment of water quality was done in holy River Ganga district of Varanasi, (U.P.) India in 2009. Water samples were collected from fives different sites namely (S 1)- Samne Ghat, (S 2)- Assi Ghat, (S 3)- Harishchandra Ghat, (S 4)- Dasaswamedh Ghat, (S 5)- Dr. Rajendra Prashad Ghat. The Ganga, one of the world's major rivers, has been venerated as the holiest and is bound with countless beliefs and faiths especially in India and adjacent countries. Its water has traditionally been regarded as pure and holy in nature gift to human. Recent experiences however do not warrant such complacency. The water resources are strained to a non-sustainable level due to rapid population growth, urban development, industrialization; livestock and power production on the Ganga Ghats at Varanasi city. The severe pollution stress and causes to which its water is subjected to the contents and quality of water and possible remedial measures. According to the result obtained by analyzing various Physico-chemical parameters of Ganga river in Varanasi City, maximum BOD recoded in (S 2)- Assi Ghat and minimum in (S 1)- Samne ghat whereas maximum DO was observed in Samne Ghat and minimum in (S 2)- Assi Ghat during Jan to March 2009 period respectively. On the basis of our experimental results it can be concluded that (S 2)- Assi Ghat exhibited higher pollution index than other ghats due to higher values of Turbidity, pH, BOD, Hardness, Alkalinity and Nitrate disposal occurring at (S 2)- Assi Ghat as well as disposal of industrial sewage in the (S 2)- Assi Ghat. Regular monitoring of Ganga river water quality is necessary to have a check on surface water quality for the sake of human life & to maintain a balanced aesthetical value of religious. We have to restore the environmental quality of Ganga which is amended by policy makers of Indian constitution. © 2011 CAFET-INNOVA TECHNICAL SOCIETY. All rights reserved.Item Phosphorus doping of ZnO using spin-on dopant process: A better choice than costly and destructive ion-implantation technique(Elsevier B.V., 2021) Mishra, M.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Radio frequency sputtered ZnO thin films doped with phosphorus (ZnO:P) have been prepared employing spin-on dopant process. In the SOD process, the dopant film has been spin-coated on a silicon substrate and positioned close to the as-deposited undoped ZnO film at high temperature to perform the phosphorus doping. The high-resolution X-ray diffraction measurement reveals that the prepared ZnO:P films are good in crystalline quality which improves further by annealing. It is found that the full-width half-maximum corresponding to (002) peak of SOD processed thin films is much narrower than previously reported ion-implanted thin films, indicating the better crystalline quality of SOD processed phosphorus-doped ZnO thin films. The X-ray photoelectron spectroscopy measurement signifies that the P2O5 decomposes into two phosphorus atoms behaving like an acceptor dopant and five oxygen atoms which may fill in oxygen vacancies at high-temperature annealing. The photoluminescence spectra discover the acceptor bound exciton peak at 3.35 eV and free electron to acceptor level transitions at 3.31 eV. The calculated acceptor binding energy is 127 meV for the phosphorus dopant which works as a shallow acceptor level. It is found that the phosphorus-doped ZnO thin films prepared using the SOD process have much superior structural and optical properties in comparison to previously reported ion-implanted film. This study demonstrates that the SOD process is much superior than the ion-implantation process to produce high-quality ZnO:P thin films for very stable p-type conduction. © 2021 Elsevier B.V.Item Unfolding the conductivity reversal n- to p-type in phosphorus-doped ZnO thin films by spin-on dopant (SOD) process(Institute of Physics, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; Chakrabarti, S.Phosphorus doping induced p-type doping in ZnO thin films based on spin-on dopant (SOD) process is reported in this article. Owing to the reduced dependence on the conventional amenities for diffusion/ion-implantation doping, the SOD process provides a simple and cheap doping method. The effect of SOD process temperature on conductivity ZnO thin films is investigated by altering the temperature from 700°C to 1000°C. Systematic field emission scanning electron microscopy analysis demonstrates the impact of doping temperature on the morphological properties of SOD. The x-ray diffraction measurements reveal that the p-type ZnO thin films had (002) preferred crystal orientation. At the same time, x-ray photoelectron spectroscopy validated the formation of the PZn-2VZn complex, which was responsible for the acceptor behaviour of films. Moreover, the photoluminescence spectra tracked down that the origin of 3.35 and 3.31 eV emission peaks is due to the acceptor bound exciton and free-electron to acceptor level transitions, respectively. Finally, an elevated hole concentration of 2.09 × 1016 cm-3 is achieved with a resistivity of 1.14 ω-cm at 800°C doping temperature. However, the film doped at 900°C and 1000°C showed n-type behaviour due to the generation of high concentration donor defects. Here, we successfully demonstrate that the SOD process has great potential to produce high-quality p-type ZnO thin films suitable for optoelectronic devices applications. © 2022 IOP Publishing Ltd.Item Investigation of phosphorus-doping of MgZnO thin films using efficient spin-on dopant process(Elsevier B.V., 2023) Mishra, M.; Saha, R.; Tyagi, L.; Sushama, S.; Pandey, S.K.; Chakrabarti, S.Phosphorus doped MgZnO thin films were prepared using the RF sputtering technique on a Si wafer, followed by spin-on doping (SOD) and annealing. The SOD is a cheap and non-destructive process in which the dopant film is spun on a Si wafer and placed in the vicinity of deposited undoped MgZnO thin film at a high temperature to perform doping. After doping, the MgZnO thin films were annealed at temperatures such as 700, 800, and 900°C, which significantly improved morphological, structural, and optical properties. The atomic force microscopy and scanning electron microscopy measurements revealed that phosphorus-doped MgZnO thin films annealed at 800–900°C have good morphology and large grains. X-ray diffraction spectra demonstrated the (002) orientation of MgZnO thin films. The photoluminescence spectra measured at 20 K demonstrated the acceptor bound exciton peak at 3.47 eV and acceptor binding energy of around 64.34 meV, indicating the formation of shallow acceptor levels by phosphorus doping of MgZnO thin films using the SOD process. In Raman spectroscopy measurement, the peak of E2high phonons mode of MgZnO wurtzite structure was observed around 436 cm−1. The FWHM value of this peak reduces with augmentation annealing temperature, demonstrating improvement in crystallinity. X-ray photoelectron spectroscopy measurement demonstrated the presence of phosphorus atoms in the SOD processed MgZnO thin films, which is again verified by Fourier-transform infrared spectroscopy measurement showing vibration modes of P–O bonds. It was observed that the different properties of SOD-prepared phosphorus-doped MgZnO films were superior to the film prepared using the alternate costly and destructive ion-implantation technique. These findings have revealed that high-quality phosphorus-doped p-type MgZnO thin films by the SOD process are very suitable for UV optoelectronic device applications. © 2023 Elsevier B.V.