Faculty Publications

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Author: search.filters.author.M.a, M.A.Subject: search.filters.subject.Electric conductivity

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    Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices
    (Elsevier B.V., 2018) M.a, M.A.; Lakshmi Ganapathi, L.G.; G N V R, V.; Udayashankar, N.K.; Mohan, S.
    Titanium nitride (TiN) thin films are deposited on Si/SiO2 substratesby using Pulsed DC magnetron sputtering and are characterized for their structural, mechanical and electrical properties for their application as localized heating elements in microsystem devices. The influence of substrate temperature on the properties of TiN films has been investigated. The correlation between the structural orientation with mechanical and electrical properties has been established. The films deposited at a substrate temperature of 300 °C have shown better structural, mechanical and electrical properties. This film has been chosen for the fabrication of microheater and its characterization. A maximum temperature of 250 °C is achieved by applying a power of 2.8 W to the microheater. © 2018 Elsevier B.V.
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    Development of titanium nitride thin film microheaters using laser micromachining
    (Elsevier Ltd, 2022) M.a, M.A.; Lakshmi Ganapathi, K.L.; Ambresh, M.; Nukala, P.; Udayashankar, N.K.; Mohan, S.
    In this paper, we report the fabrication and characterization of titanium nitride (TiN) thin-film-based microheaters. TiN thin films have been optimized on Si and SiO2 substrates for their optimum electrical resistivities by controlling the process parameters, including argon:nitrogen (Ar:N2) ratio in reactive pulsed DC magnetron sputter (PDCMS) deposition technique. An optical emission spectroscope (OES) was used for monitoring the plasma characteristics at various nitrogen flow rates. The microstructural and surface properties of the TiN films have been investigated and correlated with the electrical properties. It has been observed that the amount of nitrogen flux in the TiN plasma plays an essential role in the microstructural, surface, and electrical properties of the TiN thin films. Micro-heaters have been fabricated with TiN thin films with low electrical resistivity using laser engraving techniques instead of conventional lithographic and micromachining techniques. The TiN microheater has shown excellent performance. A temperature of 406 °C has been achieved by applying an input power of 8 W. This work paves the path for developing scalable and economic TiN microheaters using laser micromachining techniques. © 2021