Faculty Publications

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    Room-temperature ultraviolet-ozone annealing of ZnO and ZnMgO nanorods to attain enhanced optical properties
    (Springer, 2020) Alam, M.J.; Murkute, P.; Sushama, S.; Ghadi, H.; Mondal, S.; Paul, S.; Das, D.; Pandey, S.K.; Chakrabarti, S.
    ZnO and ZnMgO nanorods have proven to be promising materials for sensing, UV and deep UV based optoelectronic applications. A major drawback of ZnO and ZnMgO based thin films and nanorods is the presence of native point defects which deteriorates their optical efficiency and becomes an impediment to their efficient device applications. The furnace and rapid thermal annealing processes have overcome this up to a great extent but being high temperature processes, they put many fabrication and technological limits in device fabrication. Especially keeping an eye on the future flexible devices, herein we report ultraviolet-ozone (UVO) annealing as a room-temperature, simple and cost-effective annealing method to improve the optical efficiency of ZnO and ZnMgO nanorods along with control of defect states. The ZnO and ZnMgO nanorods were grown by hydrothermal method and annealed in UVO irradiation. UVO annealing substantially improved near band emission and suppressed defect band emissions. It is found that zinc interstitial atoms migrate from the top portion of ZnO nanorods towards the bottom of nanorods after UVO annealing, resulting in reduced zinc interstitial defects in the top portion of nanorods. X-ray diffraction results showed improvement in structural properties. XPS results confirmed suppression of oxygen vacancies and zinc interstitials and improvement in lattice oxygen in the ZnO nanorods after UVO annealing. Optimum times of UVO annealing for ZnO and ZnMgO nanorods were 30 and 50 min respectively. These findings will be helpful for the further development of ZnO and ZnMgO nanorods based high performance optoelectronic devices and sensors. © 2020, Springer Science+Business Media, LLC, part of Springer Nature.
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    Enhancement in structural, elemental and optical properties of boron–phosphorus Co-doped ZnO thin films by high-temperature annealing
    (Elsevier B.V., 2021) Sushama, S.; Murkute, P.; Ghadi, H.; Pandey, S.K.; Chakrabarti, S.
    The inherent n-type nature of zinc oxide (ZnO) and its unstable p-type behavior with single dopant species have encouraged researchers to explore the effect of multiple dopants as a viable solution for long-term stability and repeatability. Herein, we report boron (B) and phosphorus (P) co-doped ZnO thin films engineered through an optimized ion implantation technique followed by annealing at 1000 °C in oxygen ambiance. We investigated their structural, chemical, and optical properties to capture the effect of both boron implantation duration and annealing temperature. Co-doping with boron was observed to boost phosphorus incorporation in the film. Compared with P-doping, P–B co-doping increased the dominance of acceptor-bound exciton peak and also, suppressed non-radiative/visible emission which is due to reduced Madelung energy. After high-temperature annealing at 1000 °C, further narrowing of optical emission peaks generated due to acceptor incorporation was observed. Also, the co-doped samples showed stability in the acceptor behavior for more than one year. © 2021 Elsevier B.V.