Browsing by Author "Bhowmick, S."

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Effect of post-deposition annealing ambient on Gallium Oxide (Ga2O3) films
(SPIE, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; Chakrabarti, S.
Gallium Oxide (Ga2O3) is an emerging wideband semiconductor which can be utilize in solar-blind photodetector and high power electronics application. Having a large bandgap and high breakdown field makes Ga2O3 material suitable for these device applications. However, the physical and the optical properties of Ga2O3 can be tailored by changing the annealing ambient and temperature, and understanding how the annealing atmosphere can affect these properties is crucial for designing a next generation optoelectronic devices. Moreover, the presence of defects and impurities can also affect the device parameters. Thus, in this work, we have investigated the influence of post deposition annealing atmosphere on the morphological, structural, and optical properties of Ga2O3 films. The prepared samples were further went through thermal annealing at 800â„ƒ for 30 mins in Nitrogen (N2), and Oxygen (O2) ambient to achieve Î²-phase of Ga2O3. The structural properties of all the samples were studied by Atomic force microscopy, and X-ray diffraction while the optical properties were studies by UV-Visible, and photoluminescence spectroscopy. We have found monoclinic Î²-phase in the polycrystalline annealed Ga2O3 samples. The optical band gap of films were increased after annealing and highest band gap is obtained to 5.44eV in N2 annealed sample as compared to as-deposited sample (4.56eV). A broad photoluminescence spectrum ranged from 350 to 480 nm was observed, which further deconvoluted in three peaks at around 378 nm, 399 nm, and 422 nm in as-deposited sample. The same peaks with broad photoluminescence spectrum was found to be blue shifted for annealed samples as compared to the as-deposited. This study will open a new direction in future deep-UV photodetector fabrication. Â© 2022 SPIE.
Reduction of oxygen vacancy related defects in RF sputtered deposited ZnO films by impurity (Phosphorus) incorporation
(SPIE, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; das Gupta, K.D.; Chakrabarti, S.
ZnO is a fascinating wide gap (3.37 eV) semiconductor due to its tunable optical and electrical properties, which can be utilized for several nanodevices such as nanogenerators, photodetectors, sensors, lasers, and TFTs. In this study, we have investigated the effect of the incorporation of dopants on the native defects and corresponding optical properties of ZnO. We have prepared three samples for the current study and such samples are named samples Z-0, Z-1, and Z-2 for undoped ZnO film, undoped ZnO film annealed at 800Â°C, and phosphorus doped ZnO film by using spin-on dopant method at an elevated temperature of 800Â°C, respectively. The XRD results show a dominant peak along the (002) plane for all samples. The Room-temperature photoluminescence spectra reveal that the broad peak around 542 nm for sample Z-0 gradually shifts towards the UV region for samples Z-1 and Z-2 and appears around 509 nm and 413 nm, respectively. Significantly, such blue emission is associated with the transitions from oxygen vacancies to valence band or zinc interstitial to valance band. Also, relatively huge reductions in oxygen vacancies are observed in phosphorus doped ZnO films as compared with undoped and undoped-anneal films. Further, we have verified such reductions in oxygen vacancies with XPS O-1s spectra-related peaks (~531-532 eV) with high-temperature annealing and phosphorus doping. Therefore, such a type of oxygen vacancy reduction in ZnO films by cost-effective SOD doping technique is highly essential for developing several ZnObased functional devices. Â© 2022 SPIE.
Temperature Induced Conductivity Reversal in ZnO Thin Films
(SPIE, 2023) Mishra, M.; Bhowmick, S.; Saha, R.; Pandey, S.K.; Chakrabarti, S.
ZnO is a fascinating large gap (3.37 eV) semiconductor, which exhibits intrinsically n-type conductive due to its native defects such as zinc interstitials and oxygen vacancies and such n-type related defects tend to compensate the p-type acceptor defects. However, the generation process of p-type defects is more challenging for developing a good quality homojunction optical device. Here we have studied the effect of ex-situ atmospheric annealing on conductivity of ZnO films. The ZnO films were deposited using RF sputtering on Si substrate temperature at 400Â°C substrate temperature and 2.2E-2 mbar gas pressure. The films were deposited in oxygen-rich ambient to achieve less oxygen vacancy defects in the film. The ex-situ atmospheric annealing is performed at higher temperature of 900 and 1000ÂºC. The effects of this post-deposition annealing on the electrical, structural, elemental and optical properties of ZnO thin films were investigated in detail. The X-ray Diffraction (XRD) results exhibited the hexagonal wurtzite structure (002) orientation. After annealing, the XRD peak is shifted at higher 2-thetha value, which indicates a reduction in lattice constant. Further, X-ray photoelectron spectroscopy (XPS) had been done and such XPS results confirmed that simultaneous generation of acceptor defects and reduction of oxygen vacancy related donor concentrations. The electrical properties of films were studied using hall measurement system. These electrical parameters were purposive to inspect the effect of ex-situ atmospheric annealing temperatures on conductivity of films. The Hall measurement confirmed that 1000ÂºC annealed films achieve p-type conductivity with high reproducibility and such p-type behavior exhibits high mobility. Thus, temperature induced conductivity reversal could be a potential and cost-effective technique to achieve highly stable p-type ZnO films. Â© 2023 SPIE.
Unfolding the conductivity reversal n- to p-type in phosphorus-doped ZnO thin films by spin-on dopant (SOD) process
(Institute of Physics, 2022) Mishra, M.; Saha, R.; Bhowmick, S.; Pandey, S.K.; Chakrabarti, S.
Phosphorus doping induced p-type doping in ZnO thin films based on spin-on dopant (SOD) process is reported in this article. Owing to the reduced dependence on the conventional amenities for diffusion/ion-implantation doping, the SOD process provides a simple and cheap doping method. The effect of SOD process temperature on conductivity ZnO thin films is investigated by altering the temperature from 700°C to 1000°C. Systematic field emission scanning electron microscopy analysis demonstrates the impact of doping temperature on the morphological properties of SOD. The x-ray diffraction measurements reveal that the p-type ZnO thin films had (002) preferred crystal orientation. At the same time, x-ray photoelectron spectroscopy validated the formation of the PZn-2VZn complex, which was responsible for the acceptor behaviour of films. Moreover, the photoluminescence spectra tracked down that the origin of 3.35 and 3.31 eV emission peaks is due to the acceptor bound exciton and free-electron to acceptor level transitions, respectively. Finally, an elevated hole concentration of 2.09 × 1016 cm-3 is achieved with a resistivity of 1.14 ω-cm at 800°C doping temperature. However, the film doped at 900°C and 1000°C showed n-type behaviour due to the generation of high concentration donor defects. Here, we successfully demonstrate that the SOD process has great potential to produce high-quality p-type ZnO thin films suitable for optoelectronic devices applications. © 2022 IOP Publishing Ltd.