Please use this identifier to cite or link to this item: https://idr.nitk.ac.in/jspui/handle/123456789/14660
Title: Advanced two-dimensional heterojunction photocatalysts of stoichiometric and non-stoichiometric bismuth oxyhalides with graphitic carbon nitride for sustainable energy and environmental applications
Authors: Sridharan K.
Shenoy S.
Kumar S.G.
Terashima C.
Fujishima A.
Pitchaimuthu S.
Issue Date: 2021
Citation: Catalysts , Vol. 11 , 4 , p. -
Abstract: Semiconductor-based photocatalysis has been identified as an encouraging approach for solving the two main challenging problems, viz., remedying our polluted environment and the generation of sustainable chemical energy. Stoichiometric and non-stoichiometric bismuth oxyhalides (BiOX and BixOyXz where X = Cl, Br, and I) are a relatively new class of semiconductors that have attracted considerable interest for photocatalysis applications due to attributes, viz., high stability, suitable band structure, modifiable energy bandgap and two-dimensional layered structure capable of generating an internal electric field. Recently, the construction of heterojunction photocatalysts, especially 2D/2D systems, has convincingly drawn momentous attention practicably owing to the productive influence of having two dissimilar layered semiconductors in face-to-face contact with each other. This review has systematically summarized the recent progress on the 2D/2D heterojunction constructed between BiOX/BixOyXz with graphitic carbon nitride (g-C3N4). The band structure of individual components, various fabrication methods, different strategies developed for improving the photocatalytic performance and their applications in the degradation of various organic contaminants, hydrogen (H2) evolution, carbon dioxide (CO2) reduction, nitrogen (N2) fixation and the organic synthesis of clean chemicals are summarized. The perspectives and plausible opportunities for developing high performance BiOX/BixOyXz-g-C3N4 heterojunction photocatalysts are also discussed. © 2021 by the authors. Licensee MDPI, Basel, Switzerland.
URI: https://doi.org/10.3390/catal11040426
http://idr.nitk.ac.in/jspui/handle/123456789/14660
Appears in Collections:5. Miscellaneous Publications

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